In the present work, a low-pressure chemical vapor deposition (LPCVD) Ti0.17Al0.83N and state-of-the-art arc ion plating PVD-Ti1−xAlxN (x = 0.25, 0.55, 0.60, 0.67) coatings were deposited on cemented carbide substrate. The morphological, structural, electrochemical properties of LPCVD-Ti0.17Al0.83N compared. X-ray diffraction (XRD) results scanning electron microscopy (SEM) images revealed that...