In this paper we study the problem of computing the smallest-width annulus for a convex polytope in R d. This generalizes a topic from tolerancing metrology to higher dimensions, of which the planar case has been investigated by Swanson, Lee and Wu. We show this problem to be equivalent to the problem of computing diierent variants of Hausdorr-minimal spheres. We can formulate the latter proble...

We examine a family of intrinsic performance measures in terms of probability distributions that generalize Hellinger distance and Fisher information. They are applied to quantum metrology to assess the uncertainty in the detection of minute changes of physical quantities. We show that different measures lead to contradictory conclusions, including the possibility of arbitrarily small uncertain...

The use of World Web Wide for distance education has received increasing attention over the past decades. The real challenge of adapting this technology for engineering education and training is to facilitate the laboratory experiments via Internet. In the sciences, measurement plays an important role. The accuracy of the measurement, as well as the units, help scientists to better understand p...

P.I.Neyezhmakov – PhD, 1 Deputy General Director on scientific work of National Scientific Center “Institute of Metrology”( Kharkiv, Ukraine), Head of COOMET Secretariat (Euro-Asian cooperation of national metrological institutions) S.I.Zub – senior scientist of NSC “Institute of Metrology”, Kharkiv, Ukraine S.S.Zub – PhD, doctoral candidate of Taras Shevchenko National University of Kyiv, Ukraine

Novel metrology has been developed for measuring in-situ film thickness and absorption coefficient simultaneously. Designed specifically for photolithography processes, this metrology, if applied to photoresist films, can measure thickness and photoactive compound concentration in-situ, which are important parameters for photolithography process control and diagnosis.

Metrology applications commonly require non-contact, capacitive sensors for displacement measurements due to their nanometer resolution. In some metrology applications, for example, the measurement of roundness and spindle error motion, the displacements of stationary and rotating cylindrical artifacts are measured. Error from using a conventionally calibrated sensor with a non-flat (e.g., cyli...

Surface texture and its measurement are becoming the most critical factors and important functionality indicators in the performance of high precision and nanoscale devices and components. Surface metrology as a discipline is currently undergoing a huge paradigm shift: from profile to areal characterization, from stochastic to structured surfaces, and from simple geometries to complex free-form...

Some topics never fade away but also advance. Software metrology seems to be one of those. Let’s revisit it here.