A new D023 metastable phase of Cu3Au is found to grow at the interfaces of Au/Cu multilayers deposited by magnetron sputtering. The extent of formation of this novel alloy phase depends upon an optimal range of interfacial width primarily governed by the deposition wattage of the dc-magnetron used. Such interfacially confined growth is utilized to grow a ∼ 300 nm thick Au/Cu multilayer with thi...

Thin zinc oxide doped with gallium layers were prepared by rf-magnetron sputtering from nanoparticles synthesized by sol-gel method. Increasing the deposition temperature has resulted in a change of preferred orientations of (002) with an intermediate step-like structure of powder. The films showed different morphologies of the surface of the grains that are dependent on the deposition temperat...

Microelectronics technological processes are most complicated and consist of many un-predicted factors on the final device parameters. Thin films deposition methods based on magnetron plasma sputtering are influenced by lots of independent active factors. These deposition methods bring along uncertainty in the precise design process of electronic components. Thus, intelligent modeling process i...

Scandium containing multilayers have been produced with very high reflectivity in the soft x-ray spectrum. Accurate optical constants are required in order to model the multilayer reflectivity. Since there are relatively few measurements of the optical constants of Scandium in the soft x-ray region we have performed measurements over the energy range of 50-1,300 eV. Thin films of Scandium were ...

CrNx (0 ≤ x ≤ 0.91) films synthesized using highpower pulsed magnetron sputtering, also known as high-power impulse magnetron sputtering (HiPIMS), have been compared with those made by conventional direct-current (dc) magnetron sputtering (DCMS) operated at the same average power. The HiPIMS deposition rate relative to the DCMS rate was found to decrease linearly with increasing emission streng...

This contribution sheds light on the role of crystal size and phase composition in inducing biomimetic apatite growth on the surface of nanostructured titania films synthesized by reactive magnetron sputtering of Ti targets in Ar+O(2) plasmas. Unlike most existing techniques, this method enables one to deposit highly crystalline titania films with a wide range of phase composition and nanocryst...

TiO2 coatings deposited using reactive magnetron sputtering and spray coating methods, as well as Agand Mo-doped TiO2 coatings were investigated as self-cleaning surfaces for beverage processing. The mechanical resistance and retention of the photocatalytic properties of the coatings were investigated over a three-month period in three separate breweries. TiO2 coatings deposited using reactive ...

The 10 at.% Co-substituted BiFeO₃ films (of thickness 50 nm) were successfully prepared by radio frequency (r.f.) magnetron sputtering on SrTiO₃ (100) substrates with epitaxial relationships of [001](001)Co-BiFeO₃//[001](001)SrTiO₃. In this study, a single phase Co-substituted BiFeO₃ epitaxial film was fabricated by r.f. magnetron sputtering. Sputtering conditions such as Ar, O₂ gas pressure, a...

In this work, we employed classical molecular dynamics simulations model to study ZrxCu100-x (3 ≤ x ≤ 95) metallic glass films deposited on a silicon (100) substrate. Input data were chosen to fit with the experimental operating conditions of a magnetron sputtering deposition system. The growth evolution is monitored with variable compositions of the incoming atom vapor. The Zr-Zr, Cu-Cu and Zr...

Optical constants and roughness study of dc magnetron sputtered iridium films" (2002). Faculty Publications from the Department of Electrical and Computer Engineering. 5. Extremely smooth thin films of iridium have been deposited onto superpolished fused silica substrates using dc magnetron sputtering in an argon plasma. The influence of deposition process parameters on film microroughness has ...