The properties of fully complementary metal-oxide semiconductor (CMOS)-compatible metal-coated nanostructured silicon anodes for Li-ion microbatteries have been studied. The one-dimensional nanowires on black silicon (nb-Si) were prepared by inductively coupled plasma (ICP) etching and the metal (Au and Cu) coatings by successive magnetron sputtering technique. The Cu-coated nb-Si show the most...

*Corresponding author: Dr. Parviz Abdolmaleki, Department of Biophysics, Tarbiat Modares University, P. O. Box 14155-6446, Tehran, Iran. Fax: +98 21 82884717 E-mail: [email protected] Background: The Poly-Allyl Diglycol Carbonate (PADC) detector is of particular interest for development of a fast neutron dosimeter. Fast neutrons interact with the constituents of the CR-39 detector and produc...

In the current work, the effect of surface morphology on light emission property and absorption behavior of quasi-columnar macro-porous silicon (PS) was investigated. PS structures with different morphology were synthesized using photo-electrochemical etching method by applying different etching current densities. SEM micrographs showed that empty macro-pores size and porosity of PS layers were...

This paper reports research on deep etching of silicon carbide (SiC) to achieve isolated trenches in the same thick SiC substrates. combines both plasma and electrochemical p-type above n-type layers. Uniform

Figure 1 . Anisotropic etching of graphite by H 2 -plasma. a–c) AFM images of pristine, 50 W plasma-etched, and 100 W plasma-etched graphite. Plasma etching was performed at 500 ° C for 2 h. Magnifi ed images for the marked areas are shown. d) Measured maximum etching rate of graphite at various etching temperatures. The plasma power was 100 W. Solid lines represent Lorentzian line shape fi ts....

Miniaturized Electrochemical cell platforms are developed using two different approaches, namely surface and bulk micromachining technologies. Gold is used as the working electrode layer in both cases. In bulk micromachined device, electrodes are formed in the cavity created on silicon using KOH etching process while the cavity is formed using SU -8 epoxy photoresist on top of the electrodes in...

We present the study of n-GaAs surface modification by electrochemical etching in different electrolyte compositions. The possibility forming micromorphology types on identical GaAs samples, particular crystallographic, defective-dislocation, and isotope interfaces, was investigated.

Palladium is a frequently used model system for hydrogen storage. During the past few decades, particular interest was placed on the superior H-absorption properties of nanostructured Pd systems. In the present study nanoporous palladium (np-Pd) is produced by electrochemical dealloying, an electrochemical etching process that removes the less noble component from a master alloy. The volume and...