The atmospheric pressure chemical vapour deposition (APCVD) reaction of VCl4 and VOCl3 with cyclohexylphosphine at substrate temperatures of 600 C deposits thin films of amorphous vanadium phosphide. The films are black/gold, hard, chemically resistant and conductive. The APCVD reaction of MCl5 (where M = Nb or Ta) with cyclohexylphosphine at 500 C – 600 C deposits films of crystalline -MP ...

Tin nitride (Sn(x)N(y)) nanowires have been grown for the first time by chemical vapour deposition on n-type Si(111) and in particular by nitridation of Sn containing NH(4)Cl at 450 degrees C under a steady flow of NH(3). The Sn(x)N(y) nanowires have an average diameter of 200 nm and lengths >/=5 mum and were grown on Si(111) coated with a few nm's of Au. Nitridation of Sn alone, under a flow o...

Chemical vapour deposition on a Cu substrate is becoming a very important approach to obtain high quality graphene samples. Previous studies of graphene growth on Cu mainly focus on surface processes. However, recent experiments suggest that gas-phase dynamics also plays an important role in graphene growth. In this article, gas-phase processes are systematically studied using computational flu...

Carbon Nanotubes have exceptional mechanical and electrical properties. Various methods have been thoroughly investigated for the growth of CNTs. The best and the most commonly used method is Chemical Vapour Deposition (CVD). The various techniques include Reaction Chamber heating, Plasma Enhanced CVD, Hot filament CVD, Microwave CVD. The structural uniformity of carbon nanotubes produced by pl...

Vanadium dioxide (VO 2 ) undergoes semiconductor-metal phase transition (SMPT) at the ambient temperature. Due to this fact, it becomes perspective material for thermo sensors, thermo switchers, optical switchers and shutters, IR sensors, thermochromic coatings, smart coatings for glasses, holographic elements, and elements of energy-independent memory. By now, there is no doubt that the charac...

A simple one-dimensional Monte Carlo model has been developed to simulate the chemical vapour deposition (CVD) of a diamond (100) surface. The model considers adsorption, etching/desorption, lattice incorporation, and surface migration along and across the dimer rows. The top of a step-edge is considered to have an infinite Ehrlich-Schwoebel potential barrier, so that mobile surface species can...

We propose and evaluate the use of metallocene compounds as reducing agents for the chemical vapour deposition (and specifically atomic layer deposition, ALD) of the transition metal Cu from metalorganic precursors. Ten different transition metal cyclopentadienyl compounds are screened for their utility in the reduction of Cu from five different Cu precursors by evaluating model reaction energi...

Diamond layers have been deposited by hot filament chemical vapour deposition (HF CVD) on TiN-coated steel substrates. After deposition, we could observe separate, well-developed diamond icosahedrons and decahedrons on the surface. We have found that a lower content of methane in hydrogen supports their growth, this being a result of multifold twinning. The quality of diamond layers has been ev...

here two atoms recombine thus forming a diatomic molecule that can be either chemisorbed or reflected in the gas-phase in a given internal energy state. Reactions (1)-(2) are very often the rate determining step of complex heterogeneous systems of interest in different branches of industrial and technological applications, as for example in the ammonia synthesis, hydrocarbon production, chemica...