OBJECTIVE Cardiomyopathy (CMP) is a disorder associated with an increased risk of thromboembolism due to blood stasis, platelet activation and altered coagulation status. In this study, we aimed to investigate mean platelet volume (MPV) in patients with idiopathic CMP and ischemic CMP and to compare with those of the controls, and aimed to determine whether there is a relationship between MVP a...

Chemical mechanical polishing (CMP) has emerged as the planarization technique of choice in both front-end (STI) and back-end (ILD) integrated circuit manufacturing. Conventional CMP processes utilize a polyurethane polishing pad and liquid chemical slurry containing abrasive particles. More recent work has examined the use of a fixed abrasive CMP pad [1], in which abrasive material is embedded...

Chemical mechanical planarization (CMP) is a technology widely employed in device integration and processes used semiconductor fabrication. In CMP, the polishing pad plays key role both mechanically chemically. The surface of pad, consisting asperities pores, undergoes repeated cycles glazing induced by followed recovery roughness conditioning process applied during CMP. As polymer material, al...

Since first published in 1998, the Enterprise JavaBeans technology has become a popular choice for the development of middleware systems. Even though its popularity, the technology is considered quite complex and rather difficult to master. The main contribution to its complexity is the part of the EJB that deals with persistence. The most common and most popular way of implementing EJB persist...

As device sizes are scaled to sub-micron dimensions, planarization technology becomes increasingly important, both for bipolar and CMOS trench isolation and for multi-level interconnects and wiring. Although chemi-mechanical polishing (CMP) has been used extensively in silicon technology for wafer preparation[l,2], it is only recently that CMP has emerged as a new technique for achieving a high...

Chemical–mechanical polishing (CMP) is a process that planarizes semiconductor surfaces and essential for the manufacture of highly integrated devices. In CMP, pad conditioning using disk with diamond grit adopted to maintain surface roughness remove debris. However, uneven wear by unavoidable in CMP. this study, we propose contact-area-changeable system utilize it conduct preliminary study imp...

PURPOSE To evaluate the dose-response and maintenance requirements of a combination of mivacurium and pancuronium (cMP) in clinical practice. METHODS In a randomised, open clinical study, 70 patients, 17-50 yr of age, were anaesthetised with propofol, alfentanil and nitrous oxide in oxygen. Thirty patients received mivacurium and 20 patients received pancuronium to establish dose-response cur...

The Comparative Manifesto Project (CMP) provides the only time series of estimated party policy positions in political science and has been extensively used in a wide variety of applications. Recent work (e.g., Benoit, Laver, and Mikhaylov 2009; Klingemann et al. 2006) focuses on nonsystematic sources of error in these estimates that arise from the text generation process. Our concern here, by ...

aim and background: multiple sclerosis (ms) is a chronic inflammatory disease of the central nervous system in which primary symptoms emerges in adults between the age 20 and 40 years old. previous findings indicate 15-20 percent of multiple sclerosis (ms) patients are diagnosed with executive function impairments. the purpose of this study is to evaluate planning function as one of executive f...