A longstanding mine backfill design challenge is determining the strength required if (partially) cured subsequently undercut. Mitchell (1991) called undercut a sill mat and proposed an analytical solution that still often used, at least for preliminary design, has motivated subsequent empirical methods. However, fully employing requires knowledge of material’s Unconfined Compressive Strength (...

We propose a procedure for dividing indivisible items between two players in which each player ranks the items from best to worst. It ensures that each player receives a subset of items that it values more than the other player’s complementary subset, given that such an envy-free division is possible. We show that the possibility of one player’s undercutting the other’s proposal, and implementi...

Suspended shadow-mask evaporation is a simple, robust technique for fabricating Josephson-junction structures using scanning electron-beam lithography. The basic process entails the fabrication of an undercut structure in a resist bilayer to form a suspended “bridge,” followed by two angle evaporations of superconducting material with a brief oxidation step in between. The result is two overlap...

making impression to obtain an accurate working cast needs to use accurate impression materials such as polyether. on the other hand, polyether cannot be used easily in places with undercut such as excessive interproximal spaces and under the pontics of fixed partial dentures as it may be locked in these free spaces. in this article, a method is presented to blockout interproximal spaces in ord...

The use of flared tip and bi-directional servo control in some recent atomic force microscopes (AFM) has made it possible for these advanced AFMs to image structures of general shapes with undercut surfaces. AFM images are distorted representations of sample surfaces due to the dilation produced by the finite size of the tip. It is necessary to obtain the tip shape in order to correct such tip ...

A HSQ/PMMA bilayer resist system, in which HSQ as negative tone electron beam resist top layer and PMMA as bottom layer, has been investigated for negative tone lift-off process. Patterns are first defined on the HSQ resist using electron beam lithography, and then transferred into the bottom PMMA layer using oxygen reactive ion etching. Electron beam exposure of HSQ on top of PMMA layer has be...

We demonstrate a practical design and integration of multidirectional tilted UV lithography and microinjection molding for microstructure-based microfluidic devices. The previously reported undercut (or T-profile) problem of photoresist causes the imperfect mirror image duplication of the microstructures to the Ni mold. This issue inevitably leads to the unstable molds in the production of micr...

Indium tin oxide (ITO) is deposited by RF sputtering on polyethylene terephthalate substrate as transparent electrode for flexible display applications. The produced coatings are patterned in form of digits for seven-segmented indication via conventional photolithography and lift off process. The influence of the exposure dose, etching and stripping solution on the electrophysical properties of...