This paper aims to investigate the diffusion bonding of Ti6Al4V Al2O3. The potential use reactive nanolayered thin films will also be investigated. For this purpose, Ni/Ti multilayer with a 50 nm modulation period were deposited by magnetron sputtering onto base materials. Diffusion experiments performed at 800 °C, under MPa and dwell time 60 min, without interlayers. Microstructural characteri...