Multivariate control charts are very effective when monitoring several correlated characteristics. Proper process control consists of monitoring both mean and variability. In multivariate settings, the multivariate exponentially weighted moving average (MEWMA) is ideal to monitor the mean vector. Similarly, the recently-proposed multivariate exponentially weighted moving covariance matrix (MEWM...

The goal of engineering process control (EPC) is to minimize variability by adjusting some manipulative process variables. The goal of statistical process control (SPC) is to reduce variability by monitoring and eliminating assignable causes of variation. As suggested by Box and Kramer and others, it is possible to reduce both special cause and common cause variations by integrating EPC and SPC...

Gula yang merupakan bahan dasar pokok digunakan masyarakat sebagai pemanis dan juga pengawet makanan. Salah satu perusahaan agribisnis bergerak fokus pada produksi gula yaitu PT Perkebunan Nusantara XI (PTPN XI). kristal putih adalah tebu atau bit melalui proses kristalisasi untuk konsumsi rumah tangga telah dijelaskan peraturan SNI 3140.3:2010. Pabrik Djatiroto salah dari enam belas pabrik ber...

This paper proposes a multi-objective model for the economic-statistical design of the variable sample size and sampling interval multivariate exponentially weighted moving average control chart by using double warning lines. The Markov chain approach is used to obtain the statistical properties. We extend the Lorenzen and Vance cost function considering multiple assignable causes and multivari...

Abstract Many researchers have shown interest in profile monitoring; however, most of the applications this field research are developed under assumption normal response variable. Little attention has been given to monitoring with non-normal variables, known as general linear models which consists two main categories (i.e., logistic and Poisson profiles). This paper aims monitor problem Phase I...

Endpoint detection is very important undertaking on the side of getting a good understanding and figuring out if a plasma etching process is done in the right way, especially if the etched area is very small (0.1%). It truly is a crucial part of supplying repeatable effects in every single wafer. When the film being etched has been completely cleared, the endpoint is reached. To ensure the desi...