A modified cathodic arc technique has been used to deposit carbon nitride thin films directly on n Si substrates. Transmission Electron Microscopy showed that clusters of fullerene-like nanoparticles are embedded in the deposited material. Field emission in vacuum from as-grown films starts at an electric field strength of 3.8 V/μm. When the films were etched in an HF:NH4F solution for ten minu...

Amorphous carbon thin films with a wide range of sp fraction from 20 to 90% grown by filtered cathodic arc deposition have been examined by ultraviolet (UV) at 325 nm and visible Raman spectroscopy at 457 nm excitation wavelength. The comprehensive study of behaviour of G, D and T band with sp/sp content has been carried out. The upwards shift of the G peak with sp content was observed for both...

Jamesh, M., Boxman, R., Bilek, M., Kocer, C., Hu, T., Zhang, X., McKenzie, D., Chu, P. (2016). Effects of pulse voltage and deposition time on the adhesion strength of graded metal/carbon films deposited on bendable stainless steel foils by hybrid cathodic arc Glow discharge plasma assisted chemical vapor deposition. Applied Surface Science, 366, 535-544. <a href="http://dx.doi.org/10.1016/j.ap...

The species and ion charge state evolution of a pulsed cathodic arc plasma was investigated at different pressures. A zirconium cathode was operated in a nitrogen environment, and the plasma composition was analysed by time-of-flight charge-tomass spectrometry. Large plasma chemistry changes were detected with respect to time and pressure. The 250 μs plasma pulse can be divided in two character...

This paper presents a comprehensive explanation of the formation of the electric arc between opening contacts in a current carrying electric circuit. As the contacts begin to open a molten metal bridge forms between them. The rupture of this bridge and the initial formation of the electric arc are studied in both atmospheric air and vacuum using experiments to determine the direction of metal t...

In the present work, a low-pressure chemical vapor deposition (LPCVD) Ti0.17Al0.83N and state-of-the-art arc ion plating PVD-Ti1−xAlxN (x = 0.25, 0.55, 0.60, 0.67) coatings were deposited on cemented carbide substrate. The morphological, structural, electrochemical properties of LPCVD-Ti0.17Al0.83N compared. X-ray diffraction (XRD) results scanning electron microscopy (SEM) images revealed that...

Plasma-based ion implantation (PBII) is usually carried out with isotropic gaseous plasmas, such as a discharge in nitrogen. More recently, it has been applied using drifting plasmas, such as those produced by cathodic arcs, in order to allow efficient implantation of metallic species. The condensable nature of a cathodic arc plasma allows for the deposition of ion-stitched thin film coatings, ...

Jamesh, M., Boxman, R., Bilek, M., Kocer, C., Hu, T., Zhang, X., McKenzie, D., Chu, P. (2016). Effects of pulse voltage and deposition time on the adhesion strength of graded metal/carbon films deposited on bendable stainless steel foils by hybrid cathodic arc glow discharge plasma assisted chemical vapor deposition. Applied Surface Science, 366, 535-544. <a href="http://dx.doi.org/10.1016/j.ap...