Plasmonic lithography may become a mainstream nanofabrication technique in the future. Experimental results show that feature size with 22 nm resolution can be achieved by plasmonic lithography. In the experiment, a plasmonic lens (PL) is used to focus the laser energy with resolution much higher than the diffraction limit and features are created in the thermally sensitive phase-change materia...

Model predictive control (MPC) is a very popular controller design method in the process industry. One of the main advantages of MPC is that it can handle constraints on the inputs and outputs. Usually MPC uses linear discrete-time models. Recently we have extended this framework to max-plus-linear discrete event systems. In this paper we further explore this topic. More specifically, we focus ...

Computation lithography is enabled by a combination of physical understanding, mathematical abstraction, and implementation simplification. An application in the virtual world of computation lithography can be a virtual reality or a virtual virtuality depending on its engineering sensibleness and technical feasibility. Examples under consideration include design-for-manufacturability and invers...

We demonstrated the fabrication of Fresnel zone plates with a 75 nm minimum feature size and circular gratings with a 20 nm minimum linewidth in polymethyl methacrylate using nanoimprint lithography, and in metals by means of a lift-off technique. Observation of sharp Moiré patterns indicated the high fidelity of nanoimprint lithography in pattern duplication. Our results showed that nanoimprin...

In the first part of present article, important and main methods photolithography are reviewed discussed. Then we introduce ways to improve images created on photoresist, which is material lithography. Lithography with high-energy particle soft lithography then described. second part, contact-photolithography method its improvement process, use in our laboratory, introduced described detail. We...

We describe a numerical model for chip level lithography variability analysis. Gate level critical dimensions are adjusted based on lithographic variability simulations and these perturbed gate lengths are input to a chip timing analyzer. Statistical modeling studies highlight the interaction between lithography variability and chip timing performance including the role of lithography error cor...

As technology nodes continue to shrink, layout patterns become more sensitive to lithography processes, resulting in lithography hotspots that need to be identified and eliminated during physical verification. We propose an accurate hotspot detection approach based on principal component analysis-support vector machine classifier. Several techniques, including hierarchical data clustering, data...

Imprint lithography is emerging as an alternative nano-patterning technology to traditional photolithography that permits the fabrication of 2D and 3D structures with <100 nm resolution, patterning and modification of functional materials other than photoresist and is low cost, with operational ease for use in developing bio-devices. Techniques for imprint lithography, categorized as either 'mo...

As technology nodes continues shrinking, layout patterns become more sensitive to lithography processes, resulting in lithography hotspots that need to be identified and eliminated during physical verification. In this paper, we propose an accurate hotspot detection approach based on PCA (principle component analysis)-SVM (support vector machine) classifier. Several techniques, including hierar...