The microstructure of copper layers obtained by electrodeposition in stationary, pulsed and stochastic modes on substrates was studied means scanning electron microscopy. It found that the shape applied grains differs significantly case stationary application modes. technology production electrodeposited pulse is worked out work. developed automated software hardware complex used to control pro...

The Fe nanowires were prepared by Ac electrodeposition method. The two steps anodized aluminum oxides (alumina) were used as templates for electrodeposition of magnetic nanowires. Sulfuric acid was used to anodize aluminum. The pours diameter and growth rate of alumina were investigated. The FeSO4 electrolyte was used for growth of nanowires. The prepared magnetic nanowires were characterized b...

cofecu nanowires were deposited by pulsed electrodeposition technique into the porous alumina templates by a two-step mild anodization technique, using the single-bath method. the electrodeposition was performed in a constant electrolyte while cu constant was controlled by electrodeposition current. the electrodeposition current was 3.5, 4.25, 5 and 6 ma. the effect of electrodeposition current...

This study has examined the pulse electrodeposition of copper from a deep eutectic solvent. Pulse plating parameters were selected using methodologies originally developed for aqueous solutions, including constraints arising double layer charging and mass transport effects. Although could be deposited under nearly all conditions, in many instances only partial was observed current efficiencies ...

ni-w coatings, compared to pure nanocrystalline ni, exhibit higher hardness and wear resistance. in some cases, these coatings are considered as environmental friendly alternatives for hard chromium coating. till now, most of ni-w coatings have been produced by direct current electrodeposition from alkaline baths. in this study square pulse current was used for deposition of ni-w precipitates f...