Research in nanoelectronics poses new challenges for metrology, but advances in theory, simulation and computing and networking technology provide new opportunities to couple simulation and metrology. This paper begins with a brief overview of current work in computational nanoelectronics. Three examples of how computation can assist metrology will then be discussed. The paper concludes with a ...

Risk and cost must be balanced in the design of semiconductor processing metrology. More specifically, one needs to balance the cost of operating the metrology tool, and the loss in terms of processing cost and yield due to the limited sampling and the time lapse between the occurrence and the correction of a process fault. In virtual metrology (VM), the real-time data produced by the processin...

Quadriwave lateral shearing interferometry (QLSI) is a quantitative phase imaging technique based on the use of diffraction grating placed in front camera. This creates wire-mesh-like image, called an interferogram, that postprocessed to retrieve both intensity and profiles incoming light beam. Invented 90s, QLSI has been used numerous applications, e.g., laser beam characterization, lens metro...

Jean-Paul Vincent, Cyrille Baudouin, Jérôme Bruyere, Jean-Yves Dantan, Régis Bigot. Gear metrology of statistical tolerancing by numerical simulation. International Conference on Advanced Mathematical and Computational Tools in Metrology and Testing/ AMCTM VIII, Jun 2008, Paris, France. World Scientific Publishing, Advanced mathematical&computational tools in metrology&testing VIII, 78, pp.344-...

Plasma etch is a complex semiconductor manufacturing process in which material is removed from the surface of a silicon wafer using a gas in plasma form. As the process etch rate cannot be measured easily during or after processing, virtual metrology is employed to predict the etch rate instantly using ancillary process variables. Virtual metrology is the prediction of metrology variables using...

A novel method capable of delivering relative optical path length metrology with nanometer precision is demonstrated. Unlike conventional dualwavelength metrology which employs heterodyne detection, the method developed in this work utilizes direct detection of interference fringes of two He-Ne lasers as well as a less precise stepper motor open-loop position control system to perform its measu...