Nanofabrication is the core task performed and constantly further developed by today’s and future semiconductor industry. Optimization of throughput and minimizing process cost and complexity thus increasing fabrication reliability constitute the main challenges within this development. As integrated circuits continue to go smaller, laying down circuit patterns on semiconductor material becomes...

We investigate the use of a metallic nano-cavity on dielectric waveguides for sensing applications. Nowadays the fabrication of metallic structures featured by challenging dimensions is feasible thanks to the most recent technologies such as EBeam Lithography (EBL) and lift-off [1]. We propose here to study the simulation, fabrication and characterization of such structures at the telecom wavel...

The properties of metallic clusters of various shapes, on the nanometer length scale, can be dramatically different from the corresponding bulk material due to their very large surface-to-volume ratio. The unique optical and mechanical properties of such nanoclusters hold great promise for the development of nanotechnology. Gold nanoclusters, for example, have found application in such diverse ...

Writing process patterns directly on a substrate with small liquid droplets generated by Drop-On-Demand (DOD) inkjet devices offers a low cost, non-contact, low temperature, flexible, and data driven patterning approach. Existing inkjet printheads have a limited number of inkjet devices, which generate droplets on the scale of tens of microns. In our research, we have developed a monolithic ink...

The use of masks coming from research field as different as colloids, polymers or nanomaterials is a recently emerging field. Recent advances in this area have developed a variety of practical routes which have a great potential to overcome or at least complete the high-cost lithographic techniques. This review focuses on three techniques that try to reduce to the nanometer range, the size of t...

Motif parameters were introduced to characterize LER of a nanoscale grating structure. Firstly with electron beam lithography employed the expected nano-scale grating structure with linewidth 16nm was fabricated on positive resist. Then the line edge profiles of the structure were extracted and their LER was characterized. The results showed aforementioned evaluation method is rather simple, ef...

Fast and accurate reliability estimation of integrated circuits is an open problem. Introducing the emerging nano devices such as FinFET and Stacked Silicon nanowires makes this problem even more challenging because of higher lithography fluctuation. We discuss several previous efforts for reliable circuit design and propose a methodology for accurate reliability estimation of novel transistors.

Research in recent years has greatly advanced the understanding and capabilities of multi-beam interference (MBI). With this technology it is now possible to generate a wide range of one-, two-, and three-dimensional periodic optical-intensity distributions at the microand nano-scale over a large length/area/volume. These patterns may be used directly or recorded in photo-sensitive materials us...

We developed a method to fabricate an array of silver non-planar nano-arc-gaps via inverted hemispherical colloidal lithography and shadow metal evaporation methods. It is found that there is a localized surface plasmon mode which results in extraordinary optical transmission. The electric field is strongly localized at the nano-arc-gap region and therefore induces a resonance that has an ultra...