Very smooth thin films of iridium have been deposited on super polished fused silica (SiO2) substrates using dc magnetron sputtering in argon plasma. The influence of deposition process parameters on film micro roughness has been investigated. In addition, film optical constants have been determined using variable angle spectroscopic ellipsometery, over the spectra range from vacuum ultraviolet...

The X-band RF linear accelerators (LINAC’s) are popular for medical application due to its compactness [1, 2]. To increase the precision of treatment accuracy under circumstance in which the LINAC is mounted on an apparatus such as gantry frame or robot-arm; this is an advantage as the weight and size are more reduced [3]. It is a 9.3 GHz magnetron with the most readily available RF generator i...

The purpose of the designed reactor is (i) to obtain polycrystalline and∕or amorphous thin films by controlled deposition induced by a reactive sputtering magnetron and (ii) to perform a parallel in situ structural study of the deposited thin films by X-ray diffraction, in real time, during the whole growth process. The designed reactor allows for the control and precise variation of the releva...

Titanium dioxide (titania) is widely used as a photocatalyst for its moderate band gap, high photoactivity, recyclability, nontoxicity, low cost and its significant chemical stability. The anatase phase of titania is known to show the highest photocatalytic activity, however, the presence of this phase alone is not sufficient for sustained activity. In this study TiO2 coatings were deposited on...

An RF-assisted closed-field dual magnetron sputtering system was developed to characterize the plasma and the ionization fraction of sputtered material to provide a suitable system for depositing optical thin films on large-area substrates at low temperatures (<130 ◦C). The ‘prototype’ system consists of dual 76 mm dc magnetrons operated at both balanced and unbalanced (closed-field) configurat...

Amorphous carbon films with high sp content were deposited by magnetron sputtering and intense argon ion plating. Above a compressive stress of 13 GPa a strong increase of the density of the carbon films is observed. We explain the increase of density by a stress-induced phase transition of sp configured carbon to sp configured carbon. Preferential sputtering of the sp component in the carbon f...

In this study, the effect on thin film growth due to an anomalous electron transport, found in high power impulse magnetron sputtering (HiPIMS) has been investigated for the case of a planar circular magnetron. An important consequence of this type of transport is that it affects the way ions are being transported in the plasma. It was found that a significant fraction of ions are transported r...

This original work treats a new simulation method of a new type of high voltage power supply for microwave generators with N magnetrons (treated case: N=2 magnetrons), used as a source of energy in the industrial applications. This new power supply is composed of a single-phase HV transformer with magnetic leakage flow, supplying two parallel cells, which multiplies the voltage and stabilizes t...