We present an approach for producing complex nanoscale patterns by integrating computer-aided design (CAD) geometry processing with an atomic force microscope (AFM) based nanoindentation process. Surface modification is achieved by successive nano-indentation using a vibrating tip. By incorporating CAD geometry, this approach provides enhanced design and patterning capability for producing geom...

As one of the tip-based top-down nanoscale machining methods, atomic force microscopy (AFM) electric lithography is capable of directly generating flexible nanostructures on conductive or semi-conductive sample surfaces. In this work, distinct fabrication mechanisms and mechanism transition from local anodic oxidation (LAO) to electrical breakdown (BD) in the AFM nanoscale electric lithography ...

Soft lithography molding is a promising technique for patterning polymer integrated optical devices, however the presence of a background residue has the potential to limit the usefulness of this technique. We present the soft lithography technique for fabricating polymer waveguides. Several effects of the background residue are investigated numerically, including the modal properties of an ind...

In this study we fabricated a silicon-based stamp with various microchannel arrays, and demonstrated successful replication of the stamp microstructure on poly methyl methacrylate (PMMA) substrates. We used maskless UV lithography for the production of the micro-structured stamp. Thermal imprint lithography was used to fabricate microfeatured fluidic platforms on PMMA substrates, as well as to ...

This communication demonstrates a simple, soft lithographic approach to the replication and metrology of nanoscale vertical displacements. We patterned test structures with regular patterns that minimize artifacts in measurements by atomic force microscopy. A composite stamp of poly(dimethylsiloxane) (PDMS) molded against the original test structure served as a template to generate polyurethane...

The fabrication of periodic arrays of single metal nanoparticles is of great current interest. In this paper we present a straight-forward three-step procedure based on chemical electron beam lithography, which is capable of producing such arrays with gold nanoparticles (AuNPs). Preformed 6 nm AuNPs are immobilised on thiol patterns with a pitch of 100 nm by guided self-assembly. Afterwards, th...

We demonstrated a new nanoassembly strategy based on capillary force-induced cohesion of high-aspect ratio nanostructures made by electron-beam lithography. Using this strategy, ordered complex pattern were fabricated from individual nanostructures at the 10 nm length scale. This method enables the formation of complex designed networks from a sparse array of nanostructures, suggesting a number...

The use of carbon nanotubes as tips in atomic force microscopy for a systematic study of dry etching pattern transfer in GaAs is described. The GaAs samples are patterned via electron beam lithography and then etched using magnetron reactive ion or chemically assisted ion beam processing. The technique allows diagnosis, in air, of etched features with scale sizes of ,100 nm. © 1998 American Ins...