AlN thin films deposited at room temperature by reactive DC magnetron sputtering of Al target in pure argon and nitrogen atmosphere. Thin films were deposited on glass and silicon (Si) substrate at different DC power. The variation of DC power on the structural, electrical and optical properties of the films were investigated. Enhancement of crystallinity and conductivity was observed with incr...

The use of pulsed dc-sputtering sources for reactive magnetron sputtering with oxygen offers a possibility to suppress the negative effects target poisoning (such as arcing). This results in wide process range selection desired operating point. control plays major role maintaining constant coating properties and affects stoichiometry coating, well rate economic impact process. In hysteresis, du...

Transparent p-type semiconducting SrCu2O2 films have been deposited by RF magnetron sputtering under unbalanced bipolar pulsed DC bias on low-alkali glass substrates in a mixed gas of 1% H2/Ar below 400 degrees C. The pulsed DC bias voltages to substrate were varied from 0 V to -200 V with a frequency of 350 kHz. The effect of pulsed DC bias on the structure and electrical and optical propertie...

ZnO films were coated on the order of micrometer thickness on various substrates using RF magnetron sputtering. Glass, mica and Si were used as amorphous and crystalline substrates to study film growth. X-ray diffraction measurements revealed a self-induced, (002) oriented texture on all substrates. Effects of residual stresses on growth behavior and possible mechanisms of textured crystallizat...

The scope of this licentiate thesis is the investigation of carbon based thin films suitable for rolling components, especially roller bearings. Carbon and carbon nitride are materials with advantageous tribological properties and high resiliency. Such materials are required in order to withstand the demanding conditions of bearing operation, such as high loads and corrosive environments. A fun...

Magnetron sputtering has become the process of choice for the deposition of a wide range of industrially important coatings. Examples include hard, wear-resistant coatings, low friction coatings, corrosion resistant coatings, decorative coatings and coatings with speci"c optical, or electrical properties. Although the basic sputtering process has been known and used for many years, it is the de...

We investigate the growth of thin Fe layers on MgAl2O4 (001) and MgO substrates using dc magnetron sputtering. The crystal quality deposited is found to be substantially higher as compared grown substrates. effects magnetic electronic transport properties are discussed.

Present paper reports on the results of surface modification of the additively manufactured porous Ti6Al4V scaffolds. Radio frequency (RF) magnetron sputtering was used to modify the surface of the alloy via deposition of the biocompatible hydroxyapatite (HA) coating. The surface morphology, chemical and phase composition of the HA-coated alloy were studied. It was revealed that RF magnetron sp...