The filtered cathodic vacuum arc technique was employed to deposit magnetic films such as FeNi on silicon substrate. Using the normal cathode design, tetrahedral amorphous carbon and metals films can be deposited. If a magnetic target is used, the arc spot always preferably moves to the edge of the target and then extinguishes. Therefore, the arc is not stable and no film can be deposited. A ca...

This paper deals with the urgent issue of the search of new drugs based on plant raw materials that have an influence on various stages of oxidation processes occurring in the human body. The aim of this paper is to determine the antioxidant activity of the bilberry extracts that are used in the medicine practice by a cathodic voltammetry method. We consider the influence of water and alcohol b...

The main objective of this work was to assess and compare the structure mechanical properties TiN TiAlN coatings deposited on a new WC-Co tool using cathodic arc evaporation vacuum deposition (CAE-PVD) technique. cutting sintered at high temperature pressure powder tungsten carbide matrix ligated with cobalt (WC-Co). Powdered grain growth inhibitors (TiC, TaC, NbC) were admixed into enhance its...

The microstructure evolution and compositional variation of Ti3SiC2 cathode surfaces during reactive cathodic arc evaporation are presented for different process conditions. The results show that phase decomposition takes place in the near-surface region, resulting in a 5–50 m thick converted layer that is affected by the presence of nitrogen in the deposition chamber. This layer consists of tw...

Jamesh, M., Boxman, R., Bilek, M., Kocer, C., Hu, T., Zhang, X., McKenzie, D., Chu, P. (2016). Effects of pulse voltage and deposition time on the adhesion strength of graded metal/carbon films deposited on bendable stainless steel foils by hybrid cathodic arc Glow discharge plasma assisted chemical vapor deposition. Applied Surface Science, 366, 535-544. <a href="http://dx.doi.org/10.1016/j.ap...

A dual-cathode arc plasma source was combined with a computer-controlled bias amplifier to synchronize substrate bias with the pulsed production of plasma. In this way, bias can be applied in a material-selective way. The principle has been applied to the synthesis of metal-doped diamondlike carbon films, where the bias was applied and adjusted when the carbon plasma was condensing and the subs...