Both TaNx and WNxare candidates for copper liner applications. A thermal CVD process for the deposition of WNxliners, as well as both thermal CVD and plasma-assisted CVD processes for the deposition of TaNx, have been developed, all of which are carried out at wafer temperatures under 425°C. The basic material properties, conformality, thermal stability, and integration and diffusion barrier pr...

Jamesh, M., Boxman, R., Bilek, M., Kocer, C., Hu, T., Zhang, X., McKenzie, D., Chu, P. (2016). Effects of pulse voltage and deposition time on the adhesion strength of graded metal/carbon films deposited on bendable stainless steel foils by hybrid cathodic arc Glow discharge plasma assisted chemical vapor deposition. Applied Surface Science, 366, 535-544. <a href="http://dx.doi.org/10.1016/j.ap...

Silicon nanowires fabricated by metal-assisted chemical etching can present low porosity and a rough surface depending on the doping level of the original silicon wafer. In this case, wiring of silicon nanowires may represent a challenging task. We investigated two different approaches to realize the electrical contacts in order to enable electrical measurement on a rough silicon nanowire devic...

Shadow-mask-assisted flattening and deposition method fabricates wearable intraocular pressure sensors on flexible hydrogel surfaces.

The Vacuum-assisted Closure device decreases the time to wound healing, thus increasing the deposition of granulation tissue, and decreasing the use of wound care specialists. Perineal wounds present a special challenge. We present four cases of complex perineal wounds in which the Vacuum-assisted Closure device was used. In each case, wound care was simplified and healing accelerated. The Vacu...

This paper discusses the use of high power lasers in the manufacture of microelectromechanical systems (MEMS). The ability to process a wide range of materials, and to produce truly three-dimensional structures with tolerances at the micron or sub-micron level, give laser micromachining some key advantages over other more established micromachining techniques. Previous work in this area is revi...

Al-doped ZnO (AZO) thin films were deposited directly on p-GaN substrates by using a two-step deposition consisting of polymer assisted deposition (PAD) and atomic layer deposition (ALD) methods. Ohmic contacts of the AZO on p-GaN have been formed. The lowest sheet resistance of the two-step prepared AZO films reached to 145 Ω/sq, and the specific contact resistance reduced to 1.47 × 10-2 Ω·cm2...

In–Sn–O thin films with reduced indium content were synthesised by aerosol-assisted chemical vapor deposition as transparent conductors.