Silicon surfaces terminated with a mixed monolayer containing both a propyl aldehyde functionality and methyl groups were prepared and used to control the interfacial chemical and electronic properties of Si(111) surfaces during atomic-layer deposition (ALD) of Al2O3 or MnO. Si(111) surfaces functionalized only with the aldehyde moiety exhibited surface recombination velocities, S, of 2500 ± 60...

The epitaxial growth of graphene on catalytically active metallic surfaces via chemical vapor deposition (CVD) is known to be one of the most reliable routes toward high-quality large-area graphene. This CVD-grown graphene is generally coupled to its metallic support resulting in a modification of its intrinsic properties. Growth on oxides is a promising alternative that might lead to a decoupl...

Two fully analogue homologue series of thiol and selenol based aromatic self-assembled monolayers (SAMs) on Au(111) in the form of CH(3)-(C(6)H(4))(2)-(CH(2))(n)-S-Au(111) (BPnS/Au(111), n = 2-6) and CH(3)-(C(6)H(4))(2)-(CH(2))(n)-Se-Au(111) (BPnSe/Au(111), n = 2-6), respectively, have been used to elucidate the relative stability of the S-Au(111) and Se-Au(111) bonding by monitoring their exch...