EUV lithography is one of the promising technologies for manufacturing devices at 16 nm half-pitch node and below. EUV resists are required to improve the resolution, line width roughness (LWR), and sensitivity. However it is generally thought that the lithographic performance is determined by the trade-off relationship among these factors. Moreover, resist outgassing is another issue with EUV ...

This study investigated the flexural strength of eight fiber posts (one carbon fiber, one carbon/quartz fiber, one opaque quartz fiber, two translucent quartz fiber, and three glass fiber posts). Eighty fiber posts were used and divided into eight groups (n = 10): G1: C-POST (Bisco); G2: AESTHETI-POST (Bisco); G3: AESTHETI-PLUS (Bisco); G4: LIGHT-POST (Bisco); G5: D.T. LIGHT-POST (Bisco); G6: P...