The steady-state First-order Acidity Balance (FAB) model for calculating critical loads of sulphur (S) and nitrogen (N) is applied to 609 Norwegian soft-water lakes to assess the future nitrate (NO3 -) leaching potential under present (1992-96) S and N deposition. The lakes were separated into five groups receiving increasing levels of N deposition (<25, 25-49, 50-74, 75-99 and 100-125 meq m-2 ...

We present first experiments on electron beam induced deposition of silacyclohexane (SCH) and dichlorosilacyclohexane (DCSCH) under a focused high-energy electron beam (FEBID). We compare the deposition dynamics observed when growing pillars of high aspect ratio from these compounds and we compare the proximity effect observed for these compounds. The two precursors show similar behaviour with ...

Vapor deposited multilayers consisting of alternating ferromagnetic and nonferrous metals are being used for magnetic sensing and data storage devices. Their performance is dependent upon interface morphology which is a sensitive function of deposition condition such as the deposition rate, deposition temperature, and flux angle of incidence. A two-dimensional kinetic Monte Carlo method has bee...

Dry deposition of peroxyacetyl nitrate (PAN) is known to have a phytotoxic impact on plants under photochemical smog conditions, but it may also lead to higher productivity and threaten species richness of vulnerable ecosystems in remote regions. However, underlying mechanisms or controlling factors for PAN deposition are not well understood and studies on dry deposition of PAN are limited. In ...

background: periodontal ligament stem cells (pdlscs) are considered as a type of mesenchymal stem cell that is beneficial target for numerous clinical applications in periodontal tissue regeneration therapy. materials and methods: this study examined the effects of dexamethasone (dex) on human pdlscs in vitro. pdlscs obtained from the roots of patient’s teeth were cultured with dex (0.01 μm), a...

Several silicon dioxide chemical vapor deposition processes using high density plasma sources have been recently proposed in the literature [4,6] for deposition of self-planarizing inter-level dielectric deposition. All these processes exhibit the competitive effect of simultaneous deposition and etching mechanisms. In previous papers [1,2,3], a level set approach was developed for etching and ...