With the goal of facilitating the development of surface micromachined polysilicon MEMS with postprocessed on-chip circuitry, we have evaluated the impact of a 1200 C 16-h anneal upon chemical-vapor-deposited (CVD) polysilicon under a variety of processing conditions. The results show that undoped polysilicon has a final stress of +10–20 MPa even when the films are vastly different as deposited...

We report the thermally induced unconventional cracking of graphene to generate zigzag edges. This crystallography-selective cracking was observed for as-grown graphene films immediately following the cooling process subsequent to chemical vapor deposition (CVD) on Cu foil. Results from Raman spectroscopy show that the crack-derived edges have smoother zigzag edges than the chemically formed gr...

The initial growth kinetics for SiH, chemical vapor deposition of Si on SiO, at low temperature (500-600 “C) have been revealed using rapid thermal UHV-CVD, together with in situ H2 thermal desorption spectroscopy to titrate the amount of exposed Si surface. In the few mTorr pressure range, the reaction is heterogeneous, i.e., dominated by surface reaction. Below -0.7 monolayer Si coverage, the...

In order to determine the potential benefits and limitations of aluminide coatings, coatings made by chemical vapor deposition (CVD) on Feand Ni-base alloy substrates are being evaluated in various hightemperature environments. Testing of coatings on representative ferritic (Fe-9Cr-1Mo) and austenitic (type 304L stainless steel) alloys has found that high frequency thermal cycling (1h cycle tim...

We compare the recently developed Universal Thermal Climate Index (UTCI) with other thermal indices in analysing heat- and cold-related effects on cardiovascular (CVD) mortality in two different (urban and rural) regions in the Czech Republic during the 16-year period from 1994-2009. Excess mortality is represented by the number of deaths above expected daily values, the latter being adjusted f...

Boron as thin film material is of relevance for use in modern micro- and nano-fabrication technology. In this research boron films are realized by a number physical chemical deposition methods, including magnetron sputtering, electron-beam evaporation, plasma enhanced vapor (CVD), thermal/non-plasma CVD, remote CVD atmospheric pressure CVD. Various physical, mechanical characteristics these inv...