نتایج جستجو برای: solventless

تعداد نتایج: 202  

2017
Bárbara C. Leal Guilherme L. P. Aydos Paulo A. Netz Jairton Dupont

The isomerization of estragole to trans-anethole is an important reaction and is industrially performed using an excess of NaOH or KOH in ethanol at high temperatures with very low selectivity. Simple Ru-based transition-metal complexes, under homogeneous, ionic liquid (IL)-supported (biphasic) and "solventless" conditions, can be used for this reaction. The selectivity of this reaction is more...

Journal: :ChemistrySelect 2022

A series of ZnBr2 impregnated on rice husk ash silica catalysts were synthesised via the wet impregnation method for CO2 cycloaddition to styrene oxide reaction. The X-ray diffraction (XRD) analysis indicates that resulted in deterioration silica's pore channels. Catalyst with 0.5 w/w% Zn (0.5 wt %ZnBr2-SiO2) was highly active oxide. conversion (StO) 89.1 %, carbonate (SC) selectivity 92.1 % un...

Journal: :Photochem 2021

The exploitation of visible-light active photocatalytic materials can potentially change the supply energy and deeply transform our world, giving access to a carbon neutral society. Currently, most photocatalysts are produced through low-ecofriendly, dispersive, fossil-based synthesis. Over last few years, research has focused on development innovative heterogeneous by design sustainable green ...

Journal: :ACS Sustainable Chemistry & Engineering 2013

Journal: :International Journal of Experimental Spectroscopic Techniques 2016

Journal: :Biosensors & bioelectronics 2010
C Volcke R P Gandhiraman V Gubala J Raj Th Cummins G Fonder R I Nooney Z Mekhalif G Herzog S Daniels D W M Arrigan A A Cafolla D E Williams

Here we have demonstrated a solventless plasma-based process that integrates low-cost, high throughput, high reproducibility and ecofriendly process for the functionalization of the next-generation point-of-care device platforms. Amine functionalities were deposited by plasma-enhanced chemical vapour deposition (PECVD) using a new precursor. The influence of the plasma RF power and the depositi...

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