We report a simple approach to the fabrication of hierarchical nanoparticle arrays and film patterns using a novel combination of colloidal lithography (CL), two-step self-assembly, and reactive-ion etching (RIE). In this approach, a uniform nanoparticle film (∼15-50 nm particle diameter) is first deposited on a substrate. Then, larger (several hundred to thousands of nanometers diameter) micro...
