The New Millennium Interferometer Laser Metrology Testbed is a technology demonstration for a key component of the New Millennium Interferometer (NMI). For the success of NMI, NASA's proposed mission to fly a space-based interferometer, control of its position must be very precise. Laser Metrology is a powerful tool that uses interferometry to make hyper-fine distance measurements. The proposal...

A wide range of metrology processes are involved in the manufacture of large products. In addition to the traditional tool setting and product verification operations increasingly flexible metrology enabled automation is also being used. Faced with many possible measurement problems and a very large number of metrology instruments, employing diverse technologies, the selection of the appropriat...

− Accurate measurements of MEMS surfaces, geometries and motions are crucial to achieving the desired performance of the devices. The wide variety of MEMS devices in development and production requires very flexible metrology for single-platform characterization. In addition to having greatly varying geometries, devices must also be characterized statically and under actuation. White-light inte...

Abstract Two-dimensional precision stages for semiconductor lithography require sub-nm-level accuracy. Current ultraprecision stage metrology based on heterodyne laser interferometers with a 632.8-nm HeNe laser and interpolation to λ/2048 provide resolution of 0.3 nm. Unfortunately, the refractive index of air varies with CO2 and water vapor content, as well as with air turbulence. Without expe...

In integrated circuit industry, device metrology is crucial to the future development of semiconductor industry. Critical dimension scanning electron microscope (CD-SEM) is used as a tool for the linewidth measurement and critical dimension (CD) metrology. However, the signal intensity in a secondary electron image obtained by CD-SEM is influenced not only by geometry character of specimen but ...

The metrology implemented in several classical software equipping the coordinate measuring machines, does not correspond to the standardized tolerancing by zones, virtual conditions and perfect datum features fitted outside the matter. On the basis of these concepts and by generalizing them, a conceptual model of "fitting virtual gauges" is presented. On a part presenting two positional toleran...

The problem of fundamental units is discussed in the context of achievements of both theoretical physics and modern metrology. On one hand, due to fascinating accuracy of atomic clocks, the traditional macroscopic standards of metrology (second, metre, kilogram) are giving way to standards based on fundamental units of nature: velocity of light c and quantum of action h. On the other hand, the ...

Graphene grown on silicon carbide by high-temperature annealing (SiC/G) is a strong contender in the race towards large-scale graphene electronics applications. The unique electronic properties of this system lead to a remarkably robust and accurate Hall resistance quantisation of 0.1 parts per billion, making SiC/G devices highly desirable for the endeavour of quantum resistance metrology. How...

The report summarizes the Consultative Committee for Mass (CCM) key comparison CCM.P-K4.2012 for absolute pressure spanning the range of 1 Pa to 10 000 Pa. The comparison was carried out at six National Metrology Institutes (NMIs), including National Institute of Standards and Technology (NIST), Physikalisch-Technische Bundesanstalt (PTB), Czech Metrology Institute (CMI), National Metrology Ins...