Amorphous carbon films are deposited employing high power impulse magnetron sputtering (HiPIMS) at pulsing frequencies of 250 Hz and 1 kHz. Films are also deposited by direct current magnetron sputtering (dcMS), for reference. In both HiPIMS and dcMS cases, unipolar pulsed negative bias voltages up to 150 V are applied to the substrate to tune the energy of the positively charged ions that bomb...

In this paper, a magnetron memristor model based on hyperbolic sine function is presented and the correctness proved by studying the trajectory of its voltage and current phase, and then a memristor chaotic system with the memristor model is presented. The phase trajectories and the bifurcation diagrams and Lyapunov exponent spectrum of the magnetron memristor system are plotted by numerical si...

Microstructural features of sputtered chromium and chromium-50 wt. % platinum thin films on carbon substrates are presented. Films produced by rf sputtering and dc magnetron sputtering are compared using analytical electron microscopy techniques. All rf-sputtered films are uniform in chemistry and thickness and are amorphous. The chromium film became crystalline with a grain size ofless than 10...

There has been an increasing use of both solid metal and microfabricated iridium electrodes as substrates for various types of electroanalysis. However, investigations to determine heterogeneous electron transfer rate constants on iridium, especially at an electron beam evaporated or dc magnetron sputtered surface, have not previously been performed. This paper compares the results of these mic...

We have investigated the change in crystallographic and magnetic properties of sendust thin films before/after annealing. Films were deposited by both rf diode and rf magnetron sputtering. rf diode-sputtered films did not possess soft magnetic properties in the as-deposited state. Films were subsequently annealed in both a conventional oven and a rapid thermal annealing ~RTA! system. The coerci...

very smooth thin films of iridium have been deposited on super polished fused silica (sio2) substrates using dc magnetron sputtering in argon plasma. the influence of deposition process parameters on film micro roughness has been investigated. in addition, film optical constants have been determined using variable angle spectroscopic ellipsometery, over the spectra range from vacuum ultraviolet...

CHARACTERIZATION AND CORROSION OF BCC-TANTALUM COATING DEPOSITED ON ALUMINUM AND STEEL SUBSTRATE BY DC MAGNETRON SPUTTERING by Chirag Joshi Tantalum is one of the most versatile highly refractory corrosion-resistant metals. Tantalum coating can be used as an effective corrosion barrier if it is continuous, free from defects and it adheres well to the substrate. A DC magnetron sputtering techniq...

The bone response to different plasma-spray and magnetron-sputter calcium phosphate (Ca-P)-coated implants was evaluated in a rabbit animal model. Four types of Ca-P coatings have been investigated: a plasma-spray Ca-P coating (HA-PS), a heat-treated plasma-spray Ca-P coating (HA-PS/ht), an amorphous magnetron-sputter coating (Ca-P-a), and a crystalline magnetron-sputter coating (CA-P-c). Seven...

This paper continues our description of a new compact CW linac program started by Schonberg Research Corporation (SRC) under terms of a development contract. This work is now continued by High Energy Systems (HES) Division of AS&E. HES has been formed based on the acquisition of SRC by AS&E. Since we published the design and the first experimental data on the 1 MeV CW linac [1], a complete test...

Magnetron does not lend itself to pulse-compression. To achieve narrow range resolution it must transmit short pulses. For given peak-power, antenna-gain and rotation-rate, increasing energy-on-target can be achieved by increasing the pulse repetition frequency (PRF), which is ordinarily limited by the specified unambiguous range. The proposed pulse-train waveform unties the two. Transmitting t...