نتایج جستجو برای: ion beam application

تعداد نتایج: 1053523  

2000
H. Riege

The strict application of conventional extraction techniques of ion beams from a plasma source is characterized by a natural intensity limit determined by space charge.The extracted current may be enhanced far beyond this limit by neutralizing the space charge of the extracted ions in the first extraction gap of the source with electrons injected from the opposite side. The transverse and longi...

2007
F. Becker C. Andre P. Forck

The planned facility for antiproton and ion research FAIR at GSI will accelerate high intensity beams from protons to Uranium ions in the energy range of 100 MeV/u to 30 GeV/u. In the transport lines between the synchrotrons and in front of production targets precise alignment is required. Conventional intercepting diagnostics will melt due to the beam energy deposition. For transverse profile ...

B. Hu, D. Pan, R. Jia, X. Li, Y. Chen, Y. Du,

Background: Cancer stem-like cells (CSCs) play a crucial role in the initiation, progression, and recurrence of cancer. Evidence indicates that the high linear energy transfer (LET) carbon ion beam is more effective against CSCs than the conventional X-ray beam. Carbon ion radiotherapy is considered as a promising cancer strategy, however, information about whether, or not, new CSCs are induced...

2009
David Mainwaring Rainer Siegele

Scientific objectives of this project are: (1) To produce and characterise uniaxially charge conducting ion tracks in thin polymeric films with high energy ion beam irradiation. (2) To understand the charge transport mechanisms within and as well as across ion tracks, which have been identified and shown to occur via electron transport across the carbon clusters that were formed within these io...

Journal: :The Review of scientific instruments 2012
M Sasao M Kisaki T Kobuchi K Tsumori N Tanaka K Terai A Okamoto S Kitajima O Kaneko K Shinto M Wada

An energetic helium neutral beam is involved in the beam neutralization measurement system of alpha particles confined in a DT fusion plasma. A full size strong-focusing He(+) ion source (2 A, the beam radius of 11.3 mm, the beam energy less than 20 keV). Present strong-focusing He(+) ion source shows an emittance diagram separated for each beamlet of multiple apertures without phase space mixi...

2010
K. Parodi S. Brons F. Cerutti A. Ferrari A. Mairani H. Paganetti F. Sommerer

Monte Carlo (MC) methods are increasingly being utilized to support several aspects of commissioning and clinical operation of ion beam therapy facilities. In this contribution two emerging areas of MC applications are outlined. The value of MC modeling to promote accurate treatment planning is addressed via examples of application of the FLUKA code to proton and carbon ion therapy at the Heide...

2011
F. Ullmann V. P. Ovsyannikov M. Schmidt

Electron Beam Ion Sources (EBISs) provide highly charged ions (HCIs) for a variety of investigations and applications, e.g. amongst others as injection source for particle accelerators. EBISs feature a lot of advantages which qualify them for accelerator injection, and which partly compensate for their comparatively low number of particles. DREEBIT GmbH provides a family of compact EBISs based ...

2005
H. Falter P. Franzen S. Christ B. Heinemann A. Lorenz W. Kraus P. McNeely R. Riedl E. Speth D. Wünderlich

Development of negative hydrogen ion sources for neutral beam systems is closely linked with an optimisation of negative ion formation in hydrogen plasmas which requires knowledge of the plasma parameters. Emission spectroscopy is introduced as a non-invasive and in-situ diagnostic tool for line of sight averaged plasma parameters. Diagnostic lines and simplified analysis methods for a variety ...

2000
Takashi Meguro Yoshinobu Aoyagi

Dry etching techniques employing ion beam induced surface reaction and the possibility of highly charged ion beam in dry etching are described, and the preliminary work on dry etching of GaAs using highly charged ion (HCI) is also presented. In usual dry etching, total etch rate is a summation of the physical sputtering rate, the chemical etching rate, and the ion-induced chemical etching rate....

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