Magnesium fluoride is an ultraviolet (UV) transparent material which is widely used in optical applications over a wide wavelength range. We have developed a novel atomic layer deposition (ALD) process for depositing magnesium fluoride thin films for the first time. MgF2 films were grown at 250–400 uC using Mg(thd)2 and TiF4 as precursors. The crystallinity, morphology, composition, thicknesses...

Nanocomposite Cr–B–N coatings were deposited from CrB0.2 compound targets by reactive arc evaporation using an Ar/N2 discharge at 500 °C and −20 V substrate bias. Elastic recoil detection (ERDA), x-ray photoelectron spectroscopy (XPS), x-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM), and selected-area electron diffraction (SAED) were used to study the effect of...

Hydrogen is a volatile element involved in several geological processes ranging from rock weakening to the initiation of tectonic plates. Because it present diamond, investigation hydrogen content natural diamonds could provide valuable information. Such studies are scarce despite being among main impurities their structure. Using Elastic Recoil Detection Analysis, Fourier Transform Infrared sp...

Zinc oxide thin films grown by atomic layer deposition have been subject to great attention over the past few years. In this work, we study ZnO on Si substrates with di-ethyl zinc (DEZ) as metal precursor and H2O or D2O water vapour oxidant. Film composition a function of growth temperature is studied Ion Beam Analysis (IBA) using Rutherford Backscattering Spectrometry (RBS) determine Zn areal ...

Amorphous carbon films were obtained by remote microwave plasma enhanced chemical vapour deposition (RMPECVD). In this process, a mixture of argon and hydrogen is excited in the microwave discharge while methane is injected in the afterglow. The substrates are radio-frequency (RF) biased in order to improve the film properties. Three configurations have been compared : microwave, RF, and mixed ...