Supersaturation etching starts with Cl insertion into Si-Si bonds of Si 100 and leads to the desorption of SiCl2 pairs. During etching, insertion occurs through a Cl2 dissociative chemisorption process mediated by single dangling bond sites created by phonon-activated electron-stimulated desorption of atomic Cl. Based on scanning tunneling microscopy results, we identify a surface species, desc...

We present a study of the electron-stimulated desorption of deuterium cations ~D ) from thin ~1–40 ML! D 2O ice films vapor deposited on a Pt~111! substrate. Measurements of the total yield and velocity distributions as a function of temperature from 90 to 200 K show that the D yield changes with film thickness, surface temperature, and ice phase. We observe two energy thresholds for cation emi...

Focused electron beam induced deposition (FEBID) is a versatile tool for the direct-write fabrication of nanostructures on surfaces. However, FEBID nanostructures are usually highly contaminated by carbon originating from the precursor used in the process. Recently, it was shown that platinum nanostructures produced by FEBID can be efficiently purified by electron irradiation in the presence of...