نتایج جستجو برای: double gate field effect
تعداد نتایج: 2544624 فیلتر نتایج به سال:
Triple Material (TM) Double Gate (DG) Metal Oxide Semiconductor Field Effect Transistor (MOSFET) with high-k dielectric material as Gate Stack (GS) is presented in this paper. A lightly doped channel has been taken to enhance the device performance and reduce short channel effects (SCEs) such as drain induced barrier lowering (DIBL), sub threshold slope (SS), hot carrier effects (HCEs), channel...
This paper is investigated the low frequency noise behavior in subthreshold regime of gate-all-around silicon nanowire field effect transistors. Downscaling of multi gate structure beyond 50 nm gate length describes the quantum confinement related model. A drain current model has been described for output characteristics of silicon nanowire FET that is incorporated with velocity saturation effe...
High performance PMOSFETs with a gate length as short as 18-nm are reported. A self-aligned double-gate MOSFET structure (FinFET) is used to suppress the short channel effect. The 45 nm gate-length PMOS FinFET has an Idsat of 410 PA/Pm (or 820 PA/Pm depending on the definition of the width of a double-gate device) at Vd = Vg = 1.2 V and Tox = 2.5 nm. The quasi-planar nature of this variant of t...
Nanosystems are large-scale integrated systems exploiting nanoelectronic devices. In this study, we consider double independent gate, vertically stacked nanowire field effect transistors (FETs) with gate-all-around structures and typical diameter of 20 nm. These devices, which we have successfully fabricated and evaluated, control the ambipolar behaviour of the nanostructure by selectively enab...
The limits on scaling suggest the technology advancement for the solid-state devices. The double-gate (DG) MOSFET has emerged as an alternative device structure due to the certain significant advantages, i.e. increase in mobility, ideal sub-threshold slope, higher drain current, reduced power consumption and screening of source end of the channel by drain electric field (due to proximity to the...
In this paper, analytical models for NBTI induced degradation in a P-channel triple gate MOSFET and HCI induced degradation in an N-channel bulk FinFET are presented, through solving the Reaction-Diffusion equations multi-dimensionally considering geometry dependence of this framework of equations. The new models are compared to measurement data and gives excellent results. The results interpre...
In this paper, an analytical solution of the Poisson equation for double-gate metal-semiconductor-oxide field effect transistor (MOSFET) is presented, where explicit surface potential is derived so that the whole solution is fully analytical. Based on approximations of potential distribution, our solution scheme successfully takes the effect of doping concentration in each region. It provides a...
In this paper review study on different types of Junctionless transistor is promoted. Here a comparative study of SOI, bulk planar, double gate and tunnel Junctionless field effect transistor. It is observed Junctionless transistor exhibits better short channel effects and ON current then inversion mode device. Tunnel Junctionless transistor exhibits the properties of both tunnel FET and Juncti...
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