In this paper, we discuss the estimation of the parameter function for a functional logistic regression model in the presence of outliers. We consider ways that allow for the parameter estimator to be resistant to outliers, in addition to minimizing multicollinearity and reducing the high dimensionality which is inherent with functional data. To achieve this, the functional covariates and funct...

An important step in today’s Integrated Circuit (IC) manufacturing is optical proximity correction (OPC). In model based OPC, masks are systematically modified to compensate for the non-ideal optical and process effects of optical lithography system. The polygons in the layout are fragmented, and simulations are performed to determine the image intensity pattern on the wafer. Then the mask is p...