This paper reports the results of electrical characterization of aluminum thin films. Uniform Al thin films were deposited by physical vapor deposition (PVD) technique on glass substrates. The electrical resistivity of the films as a function of film thickness was studied. These parameters have been measured by four-point probe method. The electrical resistivity was obtained by the measurement ...

Sputtering is an important physical vapor deposition (PVD) method in the manufacture of many products. However, sputtering processes are prone to arcing, which can cause damage to the work piece. Therefore, arcs must be detected and extinguished in a timely manner to minimize damage. Instantaneous arc rate and total arcs per process step are useful data for assessing PVD chamber health, and det...

Photoconductivities of monocrystalline vanadium pentoxide (V2O5) nanowires (NWs) with layered orthorhombic structure grown by physical vapor deposition (PVD) have been investigated from the points of view of device and material. Optimal responsivity and gain for single-NW photodetector are at 7,900 A W-1 and 30,000, respectively. Intrinsic photoconduction (PC) efficiency (i.e., normalized gain)...

We investigate the emerging chemical states of TiN/HfO2/TiN capacitors and focus especially on identification vacancies impurities in ferroelectric HfO2 layers, which are produced either by physical vapor deposition (PVD) or atomic layer (ALD). Depending specific growth conditions, we identify different mechanisms oxygen vacancy formation. Corresponding spectral features consistently observed f...

1. Easy to plate: steel, copper and brass. These can be coat* with adherent deposits that will riot fail at the deposit-substrate interface. 2. Special treatment: stainless steels, aluminum, beryllium, magnesium and plastics. These can also be coated with adherent deposits that will not fail at the deposit-substrate interface. 3. Very difsicult: titanium, molybdenum, tungsten, niobium, tantalum...

Indentat~on technque was used to characterize the mechanical properties (elastic modulus, hardness and toughness) both of PVD coatmgs and autocatallt~c chem~cal deposition ones. TIN and TiCN films m ere respectively depos~ted on a duple.: s t adess steel substrate using PVD technque. moreover a Nip films (P content about 8O6) and a NIPIB,C composite ones were used as comparison materials The ef...

The 316 L Stainless Steel is widely used as structural material in marine applications and subject to localized pitting corrosion chlorinated environments. main aim of the present work development coatings that are alternately deposited by a combination Physical Vapor Deposition (PVD) Atomic Layer (ALD) techniques. Three different architectures PVD/ALD, ALD/PVD PVD/ALD/PVD were studied. layer A...

Multilayered hard coatings with a CrN matrix and an Al2O3, TiO2, or nanolaminate-Al2O3/TiO2 sealing layer were designed by a hybrid deposition process combined with physical vapor deposition (PVD) and atomic layer deposition (ALD). The strategy was to utilize ALD thin films as pinhole-free barriers to seal the intrinsic defects to protect the CrN matrix. The influences of the different sealing ...

A new materials group to implement dense wavelength division multiplexing (DWDM) in Si photonics is proposed. A large thermo-optic (TO) coefficient of Si malfunctions multiplexer/demultiplexer (MUX/DEMUX) on a chip under thermal fluctuation, and thus DWDM implementation, has been one of the most challenging targets in Si photonics. The present study specifies an optical materials group for DWDM...