A reversed-phase liquid chromatographic method combined with fluorescence and multiple mass spectrometric detection in series is presented for the separation and structure elucidation of bisphenol A diglycidyl ether (BADGE) and novolac glycidyl ether (NOGE) derivatives. Atmospheric pressure chemical ionization in the positive ion mode and collision induced fragmentation in the ion trap allowed ...

The requirements for better control, linearity, and uniformity of critical dimension (CD) on photomasks in fabrication of 180 and 150 nm generation devices result in increasing demand for thinner, more etching durable, and more sensitive ebeam resists. Novolac based resists with chemical amplification have been a choice for their sensitivity and stability during etching . However, difficult CD ...

The multifunctional novolac epoxy/Al 2 O 3 nanocomposites were fabricated by high-speed mechanical mixing of epoxy resin with varying concentration nano Al (0–5 wt%) particle size 13 nm for 30 min, followed curing triethylenetetramine (TETA) at 110°C 1 h and post-curing 80°C 5 h. nanocomposite samples characterized properties (viz., tensile strength, elongation-at-break, impact toughness, hardn...

It has been reported that the good correlation in sensitivity and resolution between EUV exposure EB because of similar mechanism photochemical-reaction photoresists during exposure. However, early stages resist development, there are problems on points cost time-consuming to evaluate all materials by Therefore, we investigated possibility using KrF as initial screening resists. If exposure, ca...

Traditionally, many lithography resists have used hazardous, environmentally damaging or flammable chemicals as casting solvent and developer. There is now a strong drive towards processes that are safer and more environmentally friendly. We report nanometre-scale patterning of a fullerene molecular resist film with electron beam lithography, using water as casting solvent and developer. Negati...

The aim of this contribution is the application of matrix-assisted laser desorption/ionization mass spectrometric imaging (MALDI-MSI) in the area of photolithographic structuring. As proof of concept, this method was used to image an UV exposed negative photoresist layer, which is generally used to manufacture printed circuit boards (PCB) for electronic components. The negative photoresist laye...

This paper describes a photolithographic method to create sub-micron-scale patterns of cationcross-linked poly(acrylic acid) (CCL-PAA). PAA can be cross-linked with a wide range of metal cations—including, but not limited to, Ag, Ca, Pd, Al, La, and Ti. Upon patterning a positive photoresist (diazonaphthoquinone-novolac resin) on a film of CCL-PAA, the exposed regions of CCL-PAA were etched by ...