By capactively coupling sensitive charge detectors (i.e. single-electron transistors SETs) to nanostructures such as quantum dots and two-dimensional systems, it is possible to investigate charge transport properties in extremely low conduction regimes where direct transport measurements are increasingly difficult. Ion-implanted nano-MOSFETs coupled to aluminium SETs have been constructed in or...

The presentation of FinFET Technology has opened new sections in Nano-innovation. The arrangement of ultra-thin fin empowers stifled short channel effects. It is an alluring successor to the single gate MOSFET by the righteousness of its prevalent electrostatic properties and relative simplicity of manufacturability. Fin type field-impact transistors (FinFETs) are promising substitutes for mass...

The compound semiconductor channel materials have recently drawn great attention because of their potential to solve the upcoming Si MOSFETs scaling problem and become the next generation high-speed, low-power devices. In this work we review the latest silicon technology and report the process development of submicron III-V MOSFETs. A new approach has been demonstrated to overcome the high inte...

In this paper, a thermally stable nickel silicide technology using the co-sputtering of nickel and titanium atoms capped with TiN layer is proposed for nano-scale metal oxide semiconductor field effect transistor (MOSFET) applications. The effects of the incorporation of titanium ingredient in the co-sputtered Ni layer are characterized as a function of Ti sputtering power. The difference betwe...

We present results of a discontinuous Galerkin scheme applied to deterministic computations of the transients for the Boltzmann-Poisson system describing electron transport in semiconductor devices. The collisional term models optical-phonon interactions which become dominant under strong energetic conditions corresponding to nano-scale active regions under applied bias. The proposed numerical ...

In this paper we analyze threshold voltage and body coefficient (Υ) on varying the oxide thickness in CNTFET. Simulation analysis of drain current and drain voltage characteristic is discussed and found that due to decreasing nature of quantum capacitance in CNTFET, the factor (Υ) has still impact on device and it is not negligible in deep nano regime. We also observed from simulation on nanohu...

We present the design and simulation of a single-walled carbon nanotube(SWCNT)-based field-effect transistor (FET) using Silvaco TCAD. In this paper, theself-heating effect modeling of the CNT MOSFET structure is performed and comparedwith conventional MOSFET structure having same channel length. The numericalresults are presented to show the self-heating effect on the I...

The Field Effect Transistor using nanotechnology is known as Carbon Nanotube Field Effect Transistors (CNTFET). Which promising nano-scaled devices for implementing high performance very dense and low power circuits. A Carbon Nanotube Field Effect Transistor refers to a FET with a single CNT or an array of CNT's as the channel material instead of bulk silicon in the traditional MOSFET structure...