Metal assisted photochemical etching (MAPCE) of 4H Silicon Carbide (SiC) was utilized to generate locally defined porous areas on single crystalline substrates. Therefore, Platinum (Pt) was sputter deposited on 4H-SiC substrates and patterned with photolithography and lift off. Etching was performed by immersing the Pt coated samples into an etching solution containing sodium persulphate and hy...

A highly ordered microscale Ge inverted pyramid array is fabricated by HF-free metal-assisted chemical etching. Doping in the structure significantly modifies reflection behavior mid-infrared region.

Well-ordered tilted silicon nanobelt arrays have been fabricated over a large area (≥2.5 cm(2)) by metal assisted chemical etching of pre-patterned silicon, which demonstrated markedly enhanced solar hydrogen evolution performance, compared with planar silicon of the same type and previously reported silicon nanowires prepared in a similar way.

Department of Physics and Materials Scien Chee Avenue, Kowloon Tong, Kowloon, Hon Department of Biology and Chemistry, Cit Avenue, Kowloon Tong, Kowloon, Hong Kon Centre for Functional Photonics (CFP), Cit Avenue, Kowloon Tong, Kowloon, Hong Kon Shenzhen Research Institute, City Universit † Electronic supplementary informa 10.1039/c4ra06172a ‡ These authors contributed equally to th Cite this: ...

A simple and effective method is presented for producing light-emitting porous silicon ~PSi!. A thin (d,10 nm! layer of Au, Pt, or Au/Pd is deposited on the ~100! Si surface prior to immersion in a solution of HF and H2O2 . Depending on the type of metal deposited and Si doping type and doping level, PSi with different morphologies and light-emitting properties is produced. PSi production occur...

Silicon nanostructure surface fabricated from metal-assisted etching have been demonstrated as high sensitivity matrix-free laser desorption/ionization mass spectrometry chip. The silicon nanostructure morphology was found to have direct effect to the mass spectrometry ionization efficiency. Creation of different silicon nanostructure morphologies by changing the metal thickness, etching time a...