This author; a leading proponent of the transmission of power via microwave beams, describes how the common microwave oven magnetron can be externally locked to provide 30 dB of gain-resulting in a 500 watt, 70% eficient, $15, coherent microwave source. T he 2450 MHz magnetron which supplies 700 watts of average power to the ubiquitous microwave oven is made in a quantity of 15,000,000 units an...

Magnetron sputtering has become the process of choice for the deposition of a wide range of industrially important coatings. Examples include hard, wear-resistant coatings, low friction coatings, corrosion resistant coatings, decorative coatings and coatings with speci"c optical, or electrical properties. Although the basic sputtering process has been known and used for many years, it is the de...

Pulsed magnetron oscillators sometimes show an instability known as “twinning” in which the spectrum shows two, or more, closely spaced peaks. This phenomenon is undesirable and can lead to problems when it occurs in magnetrons used in radars. An experimental investigation of twinning is described from which conclusions are drawn about the design parameters that affect it. It has been shown tha...

To facilitate the construction of the high-power magnetron, the entire output section, including the quarter wave transformer and window, has been redesigned. The new design is based on standard S band waveguide. The quarter wave transformer was changed to increase the external loading of the tube. Cold test measurements on a tube with the redesigned output section give an external Q of 230. Wo...

Sustaining a plasma in a magnetron discharge requires energization of the plasma electrons. In this work, Ohmic heating of electrons outside the cathode sheath is demonstrated to be typically of the same order as sheath energization, and a simple physical explanation is given. We propose a generalized Thornton equation that includes both sheath energization and Ohmic heating of electrons. The s...

The ZnO:Al thin films were prepared by RF magnetron sputtering on Si substrate using Pt as interdigitated electrodes. The structure was characterized by XRD and SEM analyses, and the ethanol vapor gas sensing as well as electrical properties have been investigated and discussed. The gas sensing results show that the sensitivity for detecting 400 ppm ethanol vapor was ~20 at an operating tempera...

Using a combinatorial approach, Cr, Al and C have been deposited onto sapphire wafer substrates by High Power Impulse Magnetron Sputtering (HiPIMS) and DC magnetron sputtering. X-ray photoelectron spectroscopy, X-ray absorption spectroscopy and X-ray diffraction were employed to determine the composition and microstructure of the coatings and confirm the presence of the Cr2AlC MAX phase within ...

We describe the magnetron sputtering deposition of thin films at oblique angles. A general relation between the deposition rate of the film and experimental parameters such as gas pressure or substrate tilt angle is deduced and experimentally tested. The model also permits the direct determination of the thermalization mean free path of the sputtered particles in the plasma gas, a key magnitude...