نتایج جستجو برای: dc sputtering
تعداد نتایج: 62862 فیلتر نتایج به سال:
Titanium thin films were deposited by dc magnetron sputtering. The GLancing Angle Deposition (GLAD) method was implemented to prepare two series of titanium films: perpendicular and oriented columnar structures. The first one was obtained with a conventional incidence angle of the sputtered particles ( = 0°), whereas the second one used a grazing incidence angle = 85°. Afterwards, films were an...
Nb/Cu superconducting superlattices have been fabricated by dc magnetron sputtering. This system shows a vortex glass transition with critical exponents similar to high temperatures super-conductors exponents. The transition dymensionality is governed by the superconducting coupling regime. The vortex glass transition shows a pure two dimensional behavior in decoupled superlat-tices and a quasi...
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The morphology and grown mechanism of aluminum films from 3nm to 30nm in thickness onto thermal SiO2 on Si(100) substrates have been studied by atomic force microscopy and TCR measurement. The thin films prepared by dc magnetron sputtering at 450°C is composed of islands of aluminum. The island density, distribution of island size, height, and shape are studied.
ZnOTe compounds were grown by DC magnetron cosputtering from pure Tellurium (Te) and Zinc (Zn) cathodes in O2/Ar atmosphere. The applied power on the Zn target was constant equal to 100 W, while one Te took two values, i.e., 5 W 10 W. Thus, sample series obtained which variable parameter distance targets substrate. Sample compositions determined Rutherford Backscattering Spectroscopy (RBS) expe...
Transition metal nitrides like CrN and TiN are widely used in automotive applications due to their high hardness and wear resistance. Recently, we showed that a multilayer architecture of CrN and TiN, deposited using the hybrid-high power impulse magnetron sputtering (HIPIMS) and direct current magnetron sputtering (DCMS)-HIPIMS/DCMS deposition technique, results in coatings which indicate not ...
CrNx (0 ≤ x ≤ 0.91) films synthesized using highpower pulsed magnetron sputtering, also known as high-power impulse magnetron sputtering (HiPIMS), have been compared with those made by conventional direct-current (dc) magnetron sputtering (DCMS) operated at the same average power. The HiPIMS deposition rate relative to the DCMS rate was found to decrease linearly with increasing emission streng...
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