The properties of the Y1Ba2Cu3O72x biepitaxial Josephson junctions were reproducibly modified by a focused electron beam irradiation of the interface region. The junctions were fabricated by depositing Y1Ba2Cu3O72x thin film by cylindrical magnetron sputtering technique on the ~110! SrTiO3 substrate, partially covered by a pregrown MgO seed layer. The junction parameters can be adjusted control...

The first description of the static characteristics of a device called magnetron was described by A. W. Hull in 1921. The tube had a linear filament in a coaxial cylindrical plate. The plate cylinder was surrounded by a winding, used to generate a magnetic field. The radial electric field and the superimposed magnetic field forced electrons to follow circular orbits before reaching anode. If th...

The authors report in this paper the possibility to control thickness profile of a thin film deposited by High Power Impulse Magnetron Sputtering (HiPIMS). It is shown that combination between HiPIMS discharge, an unbalanced magnetic configuration and application negative bias onto surface coat enables tailoring on demand coating profile. This effect hereafter used complex shapes such as low-be...

The corrosion behaviour of αand β-Ta coatings was compared to that of Cr coatings produced by cylindrical magnetron sputtering as well as electrodeposition. For Ta coatings, the corrosion process was dominated by dissolution of the steel substrate through open pores, however, at the end of 5 days, coating degradation was not observed. In contrast, while open pores were not observed with the Cr ...

Let A be a set of trivariate irreducible integral polynomials and let D be an A-invariant cylindrical algebraic decomposition (cad) of three-dimensional space. This paper presents a new algorithm for determining the interstack adjacencies in D over a given non-nullifying (for A) 0-cell, 1-cell adjacency in the cad D 0 of the plane induced by D. We show that this new adjacency algorithm for thre...

Of crucial importance to the thin film process engineer is an understanding of the parameters which affect the film thickness distributions which may be obtained from magnetron sources. This paper describes how variations in source design, target erosion and source-to-substrate distance affect observed uniformities from a magnetron source. A simple method of simulating magnetron sources using t...

This paper describes the design of an X-Band Magnetron to Linear Accelerator (LINAC) High Power Transfer System consisting in an 8 resonant cavities Magnetron connected to a dedicated vacuum Dielectric Window (DW). A main analytical design of devices is shown with compact formulas and is followed by numerical optimization. Electromagnetic and Thermomechanical coupling between these devices is d...