In this paper, we discuss the CDF Run II Run Control and online event monitoring system. Run Control is the top level application that controls the data acquisition activities across 150 front end VME crates and related service processes. Run Control is a realtime multi-threaded application implemented in Java with exible state machines, using JDBC database connections to con gure clients, and ...

Metal sputter deposition processes for semiconductor manufacturing are characterized by a decrease in deposition rate from run to run as the sputter target degrades. The goal is to maintain a desired deposition thickness from wafer to wafer and lot to lot. Run by run (RbR) model-based process control (MBPC) has been applied to metal sputter deposition processes at Texas Instruments. RbR MBPC, b...

Membrane ltration processes are often operated cyclically, where one cycle comprises a ltration and a backwashing phase. Due to the complex mechanisms involved, these ltration processes are mostly operated with xed values of the manipulated variables. In this paper, a model-based process control approach is introduced, which is based upon run-to-run control theory. To evaluate the controller, a...

Run-to-run optimization methodologies exploit the repetitive nature of batch processes to determine the optimal operating policy in the presence of uncertainty. In this paper, a parsimonious parameterization of the inputs is used and the decision variables of the parameterization are updated on a run-to-run basis using a feedback control scheme which tracks signals that are invariant under unce...

A run-to-run (R2R) control framework has been developed for application to supervisory control of semiconductor manufacturing processes. This generic framework, which is being developed for eventual transfer to industry, is one component of a multi-level control system that includes real-time equipment and process control as well as pseudo-real-time process control elements operating in conjunc...

Statistical control charts are useful tools in monitoring the state of a manufacturing process. Control charts are used to plot process data and compare it to the limits set for the process. Points plotting outside these limits indicate an out-of-control condition. Standard control charting procedures, however, are limited in that they cannot take into account the case when data is of a fuzzy n...