Three-dimensional (3D) nanostructures are emerging as promising building blocks for a large spectrum of applications. One critical issue in integration regards mastering the thin, flat, and chemically stable insulating layer that must be implemented on the nanostructure network in order to build striking nano-architectures. In this letter, we report an innovative method for nanoscale planarizat...

In order to manufacture short gap single Si nanowire (NW) field effect transistor (FET) by imprinting and transferring method, we introduce the method using Al2O3 sacrificial layer. The diameters of cylindrical Si NW addressed between Au electrodes by dielectrophoretic (DEP) alignment method are controlled to 106, 128, and 148 nm. After imprinting and transfer process, cylindrical Si NW is embe...

We present a novel parametric 3D shape representation, Generalized sum of Gaussians (G-SoG), which is particularly suitable for pose estimation of articulated objects. Compared with the original sum-of-Gaussians (SoG), G-SoG can handle both isotropic and anisotropic Gaussians, leading to a more flexible and adaptable shape representation yet with much fewer anisotropic Gaussians involved. An ar...

The Drosophila short gastrulation gene (sog) encodes a large extracellular protein (Sog) that inhibits signaling by BMP-related ligands. Sog and its vertebrate counterpart Chordin contain four copies of a cysteine repeat (CR) motif defined by 10 cysteine residues spaced in a fixed pattern and a tryptophan residue situated between the first two cysteines. Here we present a structure-function ana...

In this analysis, the economics of MBI International’s three-phase surfactant washing system for the removal of polychlorinated biphenyls (PCBs) from sediment was optimized. The system, which consists of a screw washer, an oil/water separator, and a vacuum filter, transfers PCBs to a sacrificial oil layer through two individual two-phase partitioning steps. At the completion of the washing proc...

We present a new technique allowing us to build freely suspended two-dimensional electron gases from AlGaAs/GaAs/AlAs heterostructures. This technique relies on an MBE-grown structures that includes a sacrificial layer. ( 1998 Elsevier Science B.V. All rights reserved.

A dry sacrificial layer process is presented in which microstructures fabricated on UV-transparent substrates are released by excimer laser ablation of a polymer sacrificial material using laser light incident from the reverse side of the substrate. We investigate the application of this technique to the batch assembly of hybrid microelectromechanical systems (MEMS) built from parts fabricated ...

A novel Silicon Sacrificial Layer Dry Etching (SSLDE) technique using sputtered amorphous or LPCVD polycrystalline silicon as sacrificial layers and a dry fluorine-based (SF6) plasma chemistry as releasing process is reported with a detailed experimental study of the release etching step. The process is capable of various applications in surface micromachining process, and can be applied in fab...