Sidewall roughness measurement is becoming increasingly important in the micro-electromechanical systems and nanoelectronics devices. Atomic force microscopy (AFM) is an emerging technique for sidewall scanning and roughness measurement due to its high resolution, three-dimensional imaging capability and high accuracy. We report an AFM sidewall imaging method with a quartz tuning fork (QTF) for...

copper films (250 nm) deposited on glass substrates, at different substrate temperatures. their optical properties were measured by ellipsometery (single wavelength of 589.3 nm) and spectrophotometery in the spectral range of 200–2600 nm. kramers kronig method was used for the analysis of the reflectivity curves of cu films to obtain the optical constants of the films, while ellipsometery measu...

The research for objectifying the handle of textile fabrics is a very important factor in the textile and garment manufacturing and retailing industries. Handle is influenced by mechanical properties of textile fabrics and the surface roughness. The KES-F system is standard objectified method among different measurement methods. But the measurement of surface roughness applied the KES-F which i...

Surface roughness measurement is widely used to estimate the quality of the product during manufacturing processes. It has a great importance in manufacturing fields such as ceramic tiles, glass, and iron. Many are using surface profile-meter with a contact stylus to measure the surface roughness of work piece. In the stylus method, a stylus is moved along the surface and the vertical movement ...

Surface roughness is an important feature of engineering surfaces. For surface roughness profile measurement, most of the exiting methods [1-6] would require isolated conditions to reduce the effect of base vibrations. The scattering interference method [7-8], based on a statistical algorithm together with comparison, may be used in a production environment, but the accuracy and reliability are...