Sputtered reactive multilayers applied as a heat source in electronic joining processes are an emerging technology. Their use promises low-stress assembly of components while improving thermal contact and reducing thermal resistance. Nanostructured surface modifications can significantly enhance adhesion and reliability of joints between different materials. This work examines reactive multilay...

Temperature measurement and control are two difficult problems in the rapid thermal processing (RTP) system. For many applications such as rapid thermal processing chemical vapor deposition (RTCVD) [1] and rapid thermal oxidation (RTO) [2], large changes in wafer emissivity can occur during film growing, leading to erroneous temperature measurements with a single wavelength pyrometer. The error...

In most RTP-based multicast applications, the RTP source sends interrelated data. Due to this interdependency, randomly joining RTP receivers usually cannot start consuming the multicast data right after they join the session. Thus, they often experience a random acquisition delay. An RTP receiver can use one or more different approaches to achieve rapid acquisition. Yet, due to various factors...

In most RTP-based multicast applications, the RTP source sends interrelated data. Due to this interdependency, randomly joining RTP receivers usually cannot start consuming the multicast data right after they join the session. Thus, they often experience a random acquisition delay. An RTP receiver can use one or more different approaches to achieve rapid acquisition. Yet, due to various factors...

rapid thermal processing (rtp) has become a key technology for semiconductor device manufacturing in a variety of applications, such as thermal oxidation, annealing, and thin-film growth. hence, understanding the radiative properties of silicon and other relevant materials is essential for the analysis of the thermal transport processes. we have analyzed and calculated the spectral, directional...

This paper presents an application of Iterative Learning Control (ILC) methodology to the temperature proole control of a Rapid Thermal Processing (RTP) system for single wafer processing (SWP), a trend in semiconductor manufacturing. The motivation and the basic ideas are brieey introduced. The eeectiveness of the proposed method is demonstrated by the simulation studies of a simpliied model o...

This study investigates the effectiveness of flash-assist rapid thermal processing in dissolving the end of range damage inherent to preamorphizing implants. A series of silicon wafers is preamorphized with a Ge implant and subsequently implanted with B. The wafers are then subjected to a flash anneal, a rapid thermal anneal, or both annealing processes. The flash anneal results in higher defec...