This paper reports on the preparation and characterization of thin films of silicon nitride deposited on heated silicon substrates from Si(CH, ),-NHS-H, mixtures activated at room temperature by an a-c. discharge at low frequency. The films were deposited at 800°C. Deposition rate as well as refractive index were measured and several parameters were systematically varied , including deposition ...

Articles you may be interested in Investigation of SiO2 plasma enhanced chemical vapor deposition through tetraethoxysilane using attenuated total reflection Fourier transform infrared spectroscopy Monte Carlo simulation of surface kinetics during plasma enhanced chemical vapor deposition of SiO2 using oxygen/tetraethoxysilane chemistry Determination of the mechanical stress in plasma enhanced ...

This paper is an attempt to synthesize nanostructured tantalum films on medical grade AISI 316L stainless steel (SS) using pulsed DC plasma assisted chemical vapor deposition (PACVD). The impact of duty cycle (17-33%) and total pressure (3-10 torr) were studied using field emission scanning electron microscopy (FESEM), grazing incidence x-ray diffraction (GIXRD), nuclear reaction analysis (NRA)...

The aim of this study was to investigate the effects of plasma-enhanced deposition of an organosilane and benzene on resin bonding to a dental zirconia ceramic. A total of 70 zirconia specimens, which were polished before sintering, were randomly divided into five groups according to surface treatments before applying a dental adhesive (each group, n = 14): group 1, no previous treatment (contr...

The paper presents the method of plasma-assisted deposition AlMgB14 films in a discharge system that consisted large volume gas plasma generator with thermionic and hollow cathode. An electrode BAM powder was placed plasma. High-frequency voltage 13.56 MHz applied to powder. In contrast traditional RF magnetron deposition, use made it possible significantly increase rate for reduce pressure wor...

We present preliminary results on a microfabrication approach to enable the integration of high yield, uniform, and preferential growth of vertically aligned carbon nanotubes ~VACNTs! on low-stress micromechanical structures using a combination of ‘‘electron-beam crosslinked’’ poly~methylmethacrylate! surface nanomachining and direct current plasma enhanced chemical vapor deposition of electric...