We report results of parallel optical nanolithography using nanoscale bowtie aperture array. These nanoscale bowtie aperture arrays are used to focus a laser beam into multiple nanoscale light spots for parallel nano-lithography. Our work employed a frequency-tripled diode-pumped solid state (DPSS) laser (lambda = 355 nm) and Shipley S1805 photoresist. An interference-based optical alignment sy...

We describe the properties of three families of inversion-symmetric, large photonic band-gap (PBG) template architectures defined by iso-intensity surfaces in four beam laser interference patterns. These templates can be fabricated by optical interference (holographic) lithography in a suitable polymer photo-resist. PBG materials can be synthesized from these templates using two stages of infil...

A fully biocompatible plasmonic quasi-3D nanostructure is demonstrated by a simple and reliable fabrication method using strong adhesion between gold and silk fibroin. The quasi-3D nature gives rise to complex photonic responses in reflectance that are prospectively useful in bio/chemical sensing applications. Laser interference lithography is utilized to fabricate large-area plasmonic nanostru...

The paper presents results of a study of slow light excitation and power enhancement on a waveguide with a grated section. The 500 periods grating was successfully fabricated by combining a conventional mask lithography step with laser interference lithography. The grating was characterized using both an end-fire and an infrared camera setup to measure respectively the transmission and to map a...

A method is presented for fabricating high-quality ridge waveguide gratings by combining conventional mask lithography with laser interference lithography. The method, which allows for apodization functions modulating both amplitude and phase of the grating is demonstrated by fabricating a grating that is chirped by width-variation of the grated ridge waveguide. The structure was optically char...

Direct Laser Interference Lithography (DLIL) has shown to be a promising technique chemically and physically alter the surface of titanium. In this work, atom probe tomography analysis was performed on DLIL-treated titanium obtain chemical composition in maxima minima interference positions. The revealed that multilayer structure consisting oxide/oxynitride is formed at both positions; however,...

Single pulse laser interference lithography is used to structure self-assembled monolayers of thiols on gold. This structuring process is investigated by attenuated total reflection measurements, and a demixing process of a binary polymer blend is used to visualize the produced surface energy pattern. The lithography can be realized with different wavelengths (266, 532, and 1064 nm) which shows...

A single-beam interference-lithography scheme is demonstrated for the fabrication of large-area slant gratings, which requires exposure of the photoresist thin film spin-coated on a glass plate with polished side-walls to a single laser beam in the ultraviolet and requires small coherence length of the laser. No additional beam splitting scheme and no adjustments for laser-beam overlapping and ...

Interference lithography (IL) is the preferred method for fabricating periodic and quasi-periodic patterns that must be spatially coherent over large areas. IL is a conceptually simple process where two coherent beams interfere to produce a standing wave, which can be recorded in a photoresist. The spatial-period of the grating can be as fine as half the wavelength of the interfering light, all...

Nanoscale patterns are fabricated by laser interference lithography (LIL) using Lloyd's mirror interferometer. LIL provides a patterning technology with simple, quick process over a large area without the usage of a mask. Effects of various key parameters for LIL, with 257 nm wavelength laser, are investigated, such as the exposure dosage, the half angle of two incident beams at the intersectio...