This paper presents a methodology for quantitative analysis of the role of electromigration (EM) reliability and interconnect performance in determining the optimal interconnect design in low-WCu interconnect systems. It is demonstrated that EM design limits for signal lines are satisfied once interconnect performance is optimized.

| The ever increasing speeds and shrinking feature sizes that are typical of state of the art integrated circuits designs have made coupling due to interconnect and packaging a very important, sometimes dominant, factor in system performance. The ability to eeciently perform coupled circuit-interconnect simulation before fabrication is essential in order to detect signal degradation due to dela...

The energy consumption of manycore architectures is dominated by data movement, which calls for energy-efficient and high-bandwidth interconnects. To overcome the bandwidth limitation electrical interconnects, integrated optics appear as a promising technology. However, it suffers from high power overhead related to low laser efficiency, use techniques methods improve its costs. Besides, approx...