نتایج جستجو برای: electron beam deposition

تعداد نتایج: 482258  

احمدی, کامران, خاکپور, علی اصغر , کاوه‌ای, قاسم ,

Two 10 and 20nm samples of Cu nano-cluster were grown on quartz substrates with a thickness of by electron beam deposition method. Nanolayers of titanium dioxide with a thickness of 300 nm were deposited on these Cu nano-cluster layers. For comparison، a layer of titanium dioxide with a thickness of 300 nm was also coated on quartz substrate. All coatings were conducted using electron-beam phys...

2015
Milos Toth Charlene Lobo Vinzenz Friedli Aleksandra Szkudlarek Ivo Utke

Focused electron beam induced processing (FEBIP) is a suite of direct-write, high resolution techniques that enable fabrication and editing of nanostructured materials inside scanning electron microscopes and other focused electron beam (FEB) systems. Here we detail continuum techniques that are used to model FEBIP, and release software that can be used to simulate a wide range of processes rep...

Journal: :Physical chemistry chemical physics : PCCP 2013
Samantha G Rosenberg Michael Barclay D Howard Fairbrother

Tungsten hexacarbonyl (W(CO)(6)) is frequently used as an organometallic precursor to create metal-containing nanostructures in electron beam induced deposition (EBID). However, the fundamental electron stimulated reactions responsible for both tungsten deposition and the incorporation of carbon and oxygen atom impurities remain unclear. To address this issue we have studied the effect of 500 e...

Journal: :Chemical communications 2012
Uroš Cvelbar Zhiqiang Chen Igor Levchenko R Michael Sheetz Jacek B Jasinski Madhu Menon Mahendra K Sunkara Kostya Ken Ostrikov

Sub-oxide-to-metallic highly-crystalline nanowires with uniformly distributed nanopores in the 3 nm range have been synthesized by a unique combination of the plasma oxidation, re-deposition and electron-beam reduction. Electron beam exposure-controlled oxide → sub-oxide → metal transition is explained using a non-equilibrium model.

2016
A Venkattraman Alina A. Alexeenko A. Venkattraman

The direct simulation Monte Carlo (DSMC) method is applied here to model the electron-beam (e-beam) physical vapor deposition of copper thin films. A suitable molecular model for copper-copper interactions have been determined based on comparisons with experiments for a 2D slit source. The model for atomic copper vapor is then used in axi-symmetric DSMC simulations for analysis of a typical e-b...

Journal: :Microscopy and Microanalysis 2003

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