Rhenium Re –Me alloys where Me = Ni, Fe, or Co were deposited galvanostatically. The plating bath consisted of ammonium perrhenate, nickel or cobalt sulfamate, or iron sulfate, citric acid, and magnesium sulfamate. The effects of bath chemistry and deposition time on faradaic efficiency FE , Re content, and partial deposition currents were determined. Rhenium contents as high as 93 atom % or FE...

The formation of Au microbump arrays for flip-chip bonding was investigated using an electroless Au plating bath. Generally, electroless Au deposition gives a low deposition rate, preventing the fabrication of Au bumps with heights of more than 5 μm. To overcome this problem, we developed a new electroless Au deposition process that employs a non-cyanide bath. This process delivers a high depos...

The Cover Feature shows the spontaneous galvanic deposition of metallic Pt nanoparticles on top, but also inner TiO2 nanotube surfaces. High-aspect-ratio and heavily reduced serves as sacrificial template during this electroless deposition. A high-performing stable hydrogen evolution cathode in acidic media is demonstrated prepared via minimal engineering low noble metal loadings. More informat...

The new revolution in materials science is being driven by our ability to manipulate matter at the molecular level to create structures with novel functions and properties. The aim of this paper is to explore new strategies to obtain plasmonic metal nanostructures through the combination of a top down method, that is electron beam lithography, and a bottom up technique, that is the chemical ele...

High area nickel and cobalt surfaces were assembled using modified Tobacco mosaic virus (TMV) templates. Rod-shaped TMV templates (300 x 18 nm) engineered to encode unique cysteine residues were self-assembled onto gold patterned surfaces in a vertically oriented fashion, producing a >10-fold increase in surface area. Electroless deposition of ionic metals onto surface-assembled virus templates...

This paper shows that the reflectance in silicon nanowires (SiNWs) can be optimized as a function of the area of silicon substrate where the nanostructure growth. SiNWs were fabricated over four different areas of silicon substrates to study the size effects using electroless etching technique. Three different etching solution concentrations of silver nitrate (AgNO3) and hydroflu...

In this talk, we report a research work on fabrication and metallization of high aspect ratio polymer microstructures fabricated using UV lithography of SU-8 on silicon substrate. Electroless plating of metal film on both the top and sidewall surfaces of microstructures were achieved while the silicon substrate was not plated. The primary chemical mechanisms and possible applications were also ...