نتایج جستجو برای: deposition kinetics

تعداد نتایج: 187944  

2015
K. H. A. Bogart N. F. Dalleska G. R. Bogart Ellen R. Fisher

Articles you may be interested in Investigation of SiO2 plasma enhanced chemical vapor deposition through tetraethoxysilane using attenuated total reflection Fourier transform infrared spectroscopy Monte Carlo simulation of surface kinetics during plasma enhanced chemical vapor deposition of SiO2 using oxygen/tetraethoxysilane chemistry Determination of the mechanical stress in plasma enhanced ...

Journal: :Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 2013

2010
Christos F. Karanikas James J. Watkins

The kinetics of ruthenium thin film deposition via the hydrogen assisted reduction of bis(2,2,6,6-tetramethyl-3,5-heptanedionato)(1,5-cyclooctadiene)ruthenium(II) [Ru(tmhd)2cod] in supercritical carbon dioxide was studied. Deposition temperature was varied from 240 C to 280 C and the apparent activation energy was determined to be 45.3 kJ/mol. Deposition rates up to 30 nm/min were attained. The...

2005
Nikolaus Dietz Martin Straßburg Vincent Woods

Understanding the gas phase decomposition kinetics of the chemical precursors involved in the nucleation and thin-film growth processes is crucial for controlling the surface kinetics and the growth process. The growth of emerging materials such as InN and related alloys requires deposition methods operating at elevated vapor densities due to the high thermal decomposition pressure of these mat...

Journal: :Colloids and surfaces. B, Biointerfaces 2011
Meiping Tong Pingting Zhu Xujia Jiang Hyunjung Kim

The influence of humic acid and alginate, two major components of natural organic matter (NOM), on deposition kinetics of extracellular polymeric substances (EPS) on silica was examined in both NaCl and CaCl(2) solutions over a wide range of environmentally relevant ionic strengths utilizing a quartz crystal microbalance with dissipation. Deposition kinetics of both soluble EPS and bound EPS ex...

2009
Lisa McElwee-White Jürgen Koller Dojun Kim Timothy J. Anderson

A chemistry-based approach to designing precursors for the deposition of inorganic films requires consideration of the physical properties of the precursor compound (e.g., volatility for transport in the reactor) and its probable decomposition pathways, both in the gas phase and on the surface during growth. We have been using Aerosol-Assisted Chemical Vapor Deposition of tungsten carbonitride ...

2013

The behaviour of E.coli are expressed in several conditions, the kinetics of E.coli are expressed by the formation characteristics in the study location, the rate of retardation are not left behind, it is express in the system, because it has a reflection on the formation variation in the study area.. Retardation factor are considered because of it influences from formation characteristic in th...

Visible light active graphitic carbon nitride/reduced graphene oxide/silver oxide nanocomposites with a p-n heterojunction structure were synthesized by chemical deposition methods. Prepared samples were characterized by different physico-chemical technics such as XRD, FTIR, SEM, TEM and DRS. Photocatalytic activity investigated by analyzing the Acid blue 92 (AB92) concentration during the time...

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