نتایج جستجو برای: dc magnetron sputtering
تعداد نتایج: 63723 فیلتر نتایج به سال:
Coating growth and mechanical properties of nanolamellar Cr2AlC coatings at various sputtering power were investigated in the present study. Cr2AlC coating was deposited on the IN 718 superalloy and (100) Si wafers by DC magnetron sputtering at different sputtering powers. The structure and properties were characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM), transmis...
Transition metal nitrides like CrN and TiN are widely used in automotive applications due to their high hardness and wear resistance. Recently, we showed that a multilayer architecture of CrN and TiN, deposited using the hybrid-high power impulse magnetron sputtering (HIPIMS) and direct current magnetron sputtering (DCMS)-HIPIMS/DCMS deposition technique, results in coatings which indicate not ...
We report the experimental observation of room-temperature perpendicular magnetic anisotropy in Ni/Pt multilayers having 7–26 Å Ni and 2.3–4.6 Å Pt layer thicknesses, prepared by dc magnetron sputtering on glass substrates at 7 mTorr Ar sputtering pressure. Perpendicular magnetic anisotropy was found to be sensitively dependent on both Niand Pt-layer thicknesses, and a maximum anisotropy energy...
A series of Co/Pd multilayers were made by dc magnetron sputter deposition on Al foil substrates. For these multilayered samples, Co layer thicknesses were less than 4 A and Pd layers were varied from 4 to 22 A. Sputtering rates were controlled by either sputtering power (10-50 W) or Ar sputtering pressure (3-15 mTorr). In both cases, lower deposition rates yielded higher perpendicular coercivi...
Optical constants and roughness study of dc magnetron sputtered iridium films" (2002). Faculty Publications from the Department of Electrical and Computer Engineering. 5. Extremely smooth thin films of iridium have been deposited onto superpolished fused silica substrates using dc magnetron sputtering in an argon plasma. The influence of deposition process parameters on film microroughness has ...
We have investigated the effects of sputtering Ar gas pressure on magnetic and magneto-optical properties in compositionally modulated Co/Pd thin films. The samples were prepared by dc magnetron sputtering from 2-in.-diam Co and Pd targets by alternately exposing the substrates to targets. Sputtering Ar gas pressure was varied from 2 to 30 mTorr. All samples had same bilayer thicknesses compose...
We report an interesting observation of minimization of bacterial attachment on titanium nitride coatings of increased thickness. DC magnetron sputtering method was used to prepare titanium nitride coatings of different thickness and the attachment of an oral bacteria Porphyromonas gingivalis was studied. With increase in thickness of the coatings the particle size increased and the order of ba...
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